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| Next generation CD Control |
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The CDC32 system improves CD Uniformity across photomasks with high repeatability and precision. This optimizes intra-field wafer CD Uniformity in the lithographic processes and guarantees highest yield for 32 nm node technology and beyond.
CDC32:
- offers a unique solution to achieve tightest CD Uniformity specifications.
- can be used with all existing or upcoming optical mask types and technologies, e.g. binary masks and PSMs as well as inverse lithography, SMO and OMOG masks including double patterning.
- improves the yield by bringing masks back into CD Uniformity specifications.
- enables to leverage existing installed mask manufacturing equipment for future nodes.
- processed masks are proven to significantly enhance wafer yield and improve product binning when one or more critical layers are processed.
- allows to process masks in mask shop as well as in a wafer fab mask room, with or without pellicle.
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