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 | | Carl Zeiss invites you to attend the 35th International Symposium for Testing and Failure Analysis
Nov 15-19, 2009 |
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San Jose McEnery Convention Center
150 West San Carlos St.
San Jose, CA 95113
The Helium Ion Microscope for High Resolution Imaging, Materials Analysis, Circuit Edit and FA Applications
Thursday, November 19, 2009: 10:40 AM
Meeting Room J3 (San Jose McEnery Convention Center)
Dr. William B. Thompson et al , Carl Zeiss SMT, Peabody, MA
Ultra-High Resolution Scanning Electron Microscopy
Monday, November 16, 2009: 2:15 PM
Meeting Room J3 (San Jose McEnery Convention Center)
Dr. William Vanderlinde , IARPA , College Park, MD
This tutorial covers the underlying theory behind SEM imaging and analysis. The limitations on resolution in the SEM will be discussed, and two methods will be presented which overcome these limitations and enable ultra-high resolution imaging: STEM-in-SEM and low-loss imaging. A new technology called Helium Ion Microscopy will also be discussed.
User's Group 3: FIB
Wednesday, November 18, 2009: 4:00 PM-6:00 PM
Meeting Room J1-J2 (San Jose McEnery Convention Center)
In addition to the conference a commercial exhibit will take place on Nov 17 & 18 - Carl Zeiss, Booth #500. Zeiss representatives will be available to discuss your applications as well as provide an overview of our SEM, TEM, FIB, HIM and optical microscope product offerings.
See you at ISTFA! | |
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