SEM Training Information
Carl Zeiss SMT - SEM Training
Training Workshop Information

Carl Zeiss SMT Inc. conducts two-day user workshops for new users. We want you to get the most from your new Zeiss SEM and encourage you to attend a workshop. These workshops go beyond the basic instrument operation training you receive during the installation of your new SEM and will help you to develop more advanced general EM skills and more specifically Zeiss SmartSEMŽ graphical user interface software based skills.

Workshops are conducted both at the Nano Solutions training facility located at our North American headquarters in Peabody, Massachusetts and at the Zeiss Center of Excellence at the University of California Irvine in Orange County near Los Angeles.

Two workshop credits are inclusive with the purchase of a new instrument. Additional workshop credits are available for purchase. Travel, meals and lodging expenses are not included in the cost of additional training credits. Workshops are segmented into EVOŽ series and FESEM series including Σigma, SupraŽ and Ultra FESEMs. There will also be periodic combined workshops with multiple instructors.

Specialized FESEM, EVOŽ and older Zeiss and LEO 1400, 1500 and 400 series two and three-day “on-site” training workshops can be arranged. Please contact Carl Zeiss Customer care at (800) 233-3334 if you would like a quotation for a training credit or if you would like a quotation for an on site training
workshop.

SEM Workshop Outline
Day 1: Review of some fundamental principles to insure that each user understands the effects of changing SEM parameters such as accelerating voltage, probe current and working distance on image quality. We will review beam formation, beam-specimen interactions, specimen charging and the selection of detectors in image formation.
The time required for this workshop will depend on the user’s background; it can be omitted or abbreviated for users with previous SEM experience.
Review of the operation of the SEM: A physical description of the instrument, maintenance, powering the instrument, logging-on and components of the Graphical User Interface (GUIF) and screen display. Additional topics in this session will include: parameter adjustments with the mouse, joystick, control panel, keyboard and tool bar icons functions. This session will also cover normal gun run up, gun alignment, aperture settings and selecting beam parameters as well as restoring and saving SEM states and stage positions. Parameter adjustments of magnification-focus, brightness-contrast, and scan rate and astigmatism correction will also be covered.
These fundamental operating modes will be covered:
  • High resolution imaging
  • High depth of field imaging
  • Low voltage imaging
  • Backscatter imaging, compositional and topographic imaging (Orientation contrast Imaging with AsB & low voltage high resolution EsB imaging on Ultra Series)
  • Variable pressure imaging using the backscatter and VPSE detectors (if applicable)
  • Charge Compensation (CC) on Ultra+ Series

Details the user interface and introduces some of the extensive software selections available: Help topics, pre defined lists, annotation, toolbar icons, pull down menu functions, dialog panels including Stage Navigation, Safe Navigation and Image Navigation. Exporting and importing images, zone control and user defined preferences will be discussed and practiced. Output device and user
magnification calibrations will be covered. Some selected advanced features of the SmartSEM software and will be introduced such as the tool bar editor, hot keys, macro editor, image processing and stage functions.

Day 2: Morning
The morning will be a hands-on session and a chance for users to pose specific questions. The user is encouraged to run the SEM and practice some of what was previously introduced. Resolution and image quality associated with SEM parameter changes and specimen interaction will be reinforced.
This session will allow for imaging on customers’ samples.

Day 2: Afternoon
The afternoon session will vary depending on attendees and product type:
  • Extended Pressure workshop: Imaging hydrated samples (EVO only)
  • Multi Mode STEM Imaging workshop (FESEM only)
  • Remote SEM workshop
  • Mosaics Imaging and Automated Stage scanning workshop
Information & Registration
Upcoming Workshops
Click on link to register...


Irvine, CA
Sept. 15-16, 2010 FESEM
Sept. 15-16, 2010 EVO SEM


Peabody, MA
Apr. 14-15, 2010 FESEM
Apr. 14-15, 2010 EVO SEM
Jun. 16-17, 2010 FESEM
Jun. 16-17, 2010 EVO SEM


Location & Contact Info

Univ of California Irvine
Zeiss Center of Excellence
2302 CALIT2
Irvine, CA 92697

Dr. Clive Hayzelden
c.hayzelden@smt.zeiss.com
949-824-0313


Carl Zeiss SMT Inc.
Nano Solutions Center
One Corporation Way
Peabody, MA 01960
Phone: (978) 826-1500

Ms. Alex McDougall
978-826-1500