Your Ion Beam Microscope for sub-10nm applications


Watch the Webinar by Materials Today

Watch the Product Trailer

ORION NanoFab Helium Ion Beam Microscope

EVO® HD – High Performance, Total Flexibility

Your 3-in-1 Multibeam Ion Microscope for Sub-10nm Nanostructuring

Fabricate sub-10nm nanostructures with speed and precision. Seamlessly switch between gallium, neon and helium beams with ORION NanoFab:

  • Use the neon beam to machine nanostructures at great speed and achieve high throughput.
  • Use the helium beam to create delicate sub-10 nm structures.
  • Use optional gallium FIB to remove massive material.

With ORION NanoFab you profit from the only system in the world that covers the complete range of micromachining to nanomachining applications using gallium, neon and helium ion beams integrated in a single instrument.

Ask your ZEISS contact about ORION NanoFab now!

  • Fast machining of sub-10 nm structures
    Use neon and helium ion beams to create delicate sub-10 nanometer structures that demand extremely high machining fidelity. Whether your application is material removal using sputtering, gas induced etching or deposition or lithography, ORION NanoFab excels in sub-10 nm fabrication with speed and ease.

  • Three beams in one instrument
    Use gallium FIB to remove massive material. Take advantage of the neon beam for precision nanomachining with speed or use the helium beam to fabricate delicate sub-10 nm structures. With neon and helium ion beams you avoid deposit contamination.

  • High resolution imaging
    With imaging resolution of 0.5 nm, ORION NanoFab generates high resolution images of your sample in the same instrument that you used for fabrication. Gain new insights with images that have 5 to 10 times greater depth of field when compared to images acquired with FE-SEMs.

Ask your ZEISS contact about ORION NanoFab now!

Orion NanoFab features the NanoPatterning and Visualization Engine - an integrated hardware and software control system. NVPE incorporates a dedicated 16 bit scan generator for each NanoFab column and dual signal acquisition hardware supporting real-time advanced patterning and visualization. Completely control the beam by a GUI: create a range of fully editable shapes including rectangles, trapezoids, polygons, lines, polylines, ellipses and spots. Vectorfill these shapes while maintaining full control over dose variation and patterning parameters.

Ask your ZEISS contact about ORION NanoFab now!

Product Information (4.02 MB)

White Papers

Sub-10 nm Nano-machining with Multiple Ion Beams (1.88 MB)
Plasmonic Devices Fabricated with Helium Ion Microscopy (2.41 MB)
Advancing Oil and Gas Exploration with ORION NanoFab (2.87 MB)
An Overview of Applications (2.46 MB)
HIM for the imaging of bio samples at sub-nanometer resolution (4.4 MB)


Product Information (interactive iBook; 34 MB)

For the iBooks version: Either download the file to your computer and perform a manual sync with iTunes, or download the file directly onto your iOS device via WiFi and the Safari Browser.