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Your Ion Beam Microscope for sub-10nm applications



Further information, device demonstration and more

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EVO® HD – High Performance, Total Flexibility

Your 3-in-1 Multibeam Ion Microscope for Sub-10nm Nanostructuring

Fabricate sub-10nm nanostructures with speed and precision. Seamlessly switch between gallium, neon and helium beams with ORION NanoFab:

  • Use the neon beam to machine nanostructures at great speed and achieve high throughput.
  • Use the helium beam to create delicate sub-10 nm structures.
  • Use optional gallium FIB to remove massive material.

With ORION NanoFab you profit from the only system in the world that covers the complete range of micromachining to nanomachining applications using gallium, neon and helium ion beams integrated in a single instrument.

Ask your ZEISS contact about ORION NanoFab now!

  • Fast machining of sub-10 nm structures
    Use neon and helium ion beams to create delicate sub-10 nanometer structures that demand extremely high machining fidelity. Whether your application is material removal using sputtering, gas induced etching or deposition or lithography, ORION NanoFab excels in sub-10 nm fabrication with speed and ease.

  • Three beams in one instrument
    Use gallium FIB to remove massive material. Take advantage of the neon beam for precision nanomachining with speed or use the helium beam to fabricate delicate sub-10 nm structures. With neon and helium ion beams you avoid deposit contamination.

  • High resolution imaging
    With imaging resolution of 0.5 nm, ORION NanoFab generates high resolution images of your sample in the same instrument that you used for fabrication. Gain new insights with images that have 5 to 10 times greater depth of field when compared to images acquired with FE-SEMs.

Ask your ZEISS contact about ORION NanoFab now!

Orion NanoFab features the NanoPatterning and Visualization Engine - an integrated hardware and software control system. NVPE incorporates a dedicated 16 bit scan generator for each NanoFab column and dual signal acquisition hardware supporting real-time advanced patterning and visualization. Completely control the beam by a GUI: create a range of fully editable shapes including rectangles, trapezoids, polygons, lines, polylines, ellipses and spots. Vectorfill these shapes while maintaining full control over dose variation and patterning parameters.

Ask your ZEISS contact about ORION NanoFab now!


Three Ion Beams for Total Flexibility in Sub10-nm Fabrication

Pages: 19
Filesize: 6,184 kB
Revision 2012-09-19

ZEISS ORION NanoFab (in Portuguese Language)

Três feixes de íons para total Flexibilidade na Fabricação de estruturas inferiores a 10 nm

Pages: 19
Filesize: 6,071 kB
Revision 2014-11-12

ZEISS ORION NanoFab (in Spanish Language)

Tres haces de iones para una flexibilidad total en procesos de fabricación por debajo de 10 nm

Pages: 19
Filesize: 6,270 kB
Revision 2013-05-23

ZEISS ORION NanoFab (in Korean Language)

세 가지 이온 빔으로 10 nm 미만 제작 공정에서 최대의 유연성을 실현

Pages: 19
Filesize: 6,555 kB
Revision 2013-11-28

White Paper: Sub-10 nm Nano-machining with Multiple Ion Beams

for High Precision and High Throughput Applications

Pages: 5
Filesize: 1,923 kB
Revision 2012-09-16

White Paper: Advancing Oil and Gas Exploration with ORION NanoFab

Pages: 6
Filesize: 2,807 kB
Revision 2012-09-17

White Paper: ORION NanoFab: An Overview of Applications

Pages: 6
Filesize: 1,425 kB
Revision 2012-09-17

White Paper: ORION NanoFab - Plasmonic Devices Fabricated with Helium Ion Microscopy

Pages: 5
Filesize: 2,478 kB
Revision 2012-09-16