Workshops and Training

EVO® Series SEM Workshop

EVO® Series SEM Workshop

Day 1

We will review of some of the fundamental principles of SEM parameters, such as accelerating voltage, probe current and working distance and their affects on image quality. We will also cover beam formation, beam-specimen interactions, specimen charging and the selection of detectors in image formation.

The time required for this workshop will depend on the user’s background; it can be omitted or abbreviated for users with previous SEM experience.

During the review of the operation of the EVO SEM, we will review a physical description of the instrument, maintenance, powering the instrument, logging-on and components of the Graphical User Interface (GUIF) and screen display. Additional topics in this session will include: parameter adjustments with the mouse, joystick, control panel, keyboard and tool bar icons functions. This session will also cover normal gun run up, filament saturation, gun alignment, aperture settings and selecting beam parameters, as well as restoring and saving SEM states and stage positions. Parameter adjustments of magnification-focus, brightness-contrast, and scan rate and astigmatism correction will also be covered.

These fundamental operating modes will be covered:

  • High resolution low probe current imaging
  • High depth of field
  • Low voltage imaging in high vacuum
  • Backscatter detector, compositional and topographic imaging
  • Variable pressure imaging using the backscatter and VPSE detectors (if applicable)
  • CL imaging with VPSE detector
  • Optibeam EZ-VP Mode: (EVO HD series only)


We will also cover details of the user interface and introduce some of the extensive software selections available, such as help topics, pre-defined lists, annotation, toolbar icons, pull-down menu functions and dialog panels including Stage Navigation, Safe Navigation and Image Navigation. Exporting and importing images, zone control and user defined preferences will be discussed and practiced as well as printing images and image resolution. Some selected advanced features of the SmartSEM software will be introduced, such as the tool bar editor, hot keys, macro editor, image processing and stage functions.

Day 2


The morning will be a hands-on session and a chance for users to pose specific questions. We will cover changing tungsten and LaB6 filaments as well as specific gun run up and alignments. We will also go over cleaning and replacing the 100 micron fixed aperture. The user will be encouraged to run the SEM and practice some of what was previously introduced. Resolution and image quality associated with SEM parameter changes and specimen interaction will be reinforced. This session may also allow imaging on your samples.

The afternoon session can vary depending on attendees. These are some typical topics:

  • Extended Pressure Workshop: Imaging hydrated samples in EP mode using Peltier cool-stage
  • Correlative Microscopy: Correlative Light and Electron microscopy (CLEM) with Shuttle & Find
  • Remote SEM: Remote operation of the SEM using Webex, UltraVNC and other shared desktop applications
  • SEM Automation: Automated, unattended image acquisition and mosaics
  • STEM Imaging: Low voltage scanning, transmission electron microscopy with the SEM