Thank you for your interest in this Science/AAAS webinar. We are looking forward to the webinar and hope to see you there.
Date: Wednesday, June 27, 2018, 6 PM CEST / 9 AM PDT
Ruth Schwaiger (Karlsruhe Institute of Technology, Karlsruhe, Germany)
Hrishikesh Bale (ZEISS Microscopy, Pleasanton, CA, USA)
Surrounding this webinar, you might have questions or want to dive deeper into specific areas of interest. The challenge of understanding underlying deformation mechanisms are constantly increasing as the ability to construct this new class of materials advances.
Below, please find a short collection of resources that will help you to explore specific topics of interest in more detail:
- 3D additive manufacturing technologies
- High resolution imaging
- In situ methods
Do you need to break the 10 nm barrier for your device fabrication? In this video, you will go inside ZEISS ORION NanoFab to learn how three ion beams and a gas injection system are used in nanofabrication. The gallium beam is used to quickly remove bulk material. The inert neon beam refines the design. Finally, the helium beam makes the finest cuts, completing the device.
This reference list covers over 400 publications investigating nanomaterials, semiconductor structures, circuit editing and analysis, nanopore milling, graphene imaging and structuring, high temperature superconductor fabrication, plasmonic device structuring, and biological material imaging. The instrumentation that enabled this research is gas field ion beam microscopy, providing damage-free imaging of nanometer features and nanofabrication of sub-10 nm structures.
Discover in this application note how ZEISS ORION NanoFab provides high resolution imaging of complex polymer structures with high resolution, high contrast, and no charging artifacts. Learn more about the helium ion beam’s advantages that are attributed to the unique sample interaction of helium ions with low atomic number materials, providing new insights into polymers.
X-ray microscopy (XRM) enables non-destructive 3D investigation of a variety of samples across multiple length scales. Learn in this technology note more about how nanoscale XRM with resolution down to tens of nanometers has long been developed at synchrotron radiation facilities, driven by the development of advanced X-ray optics such as Fresnel zone plates. ZEISS Xradia Ultra is the first instrument to bring this capability to the user’s own laboratory. In this paper, we discuss the technology behind Xradia Ultra and resulting performance, including X-ray optics, energy, and contrast modes.
This technology note describes nanometer scale EDS analysis using low-voltage FE-SEM and a windowless EDS detector. The investigation of morphology and chemistry of materials by combining scanning electron microscopy (SEM) with energy dispersive X-ray spectroscopy (EDS) is a well-known method. Characterizing structures on a nano-scale is a challenge because the resolution of EDS analysis is typically limited to micrometers. High resolution low voltage SEM and a windowless EDS detector, used for this study, push the resolution down to 10 nm.
In case you are interested in more contents like the ones above, try out the ZEISS Microscopy Newsletter for Materials Science. Be one the first to receive:
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