Encounter a new paradigm in ion beam microscopy. Rediscover sample preparation, tomography and analytics enabling you to open up first-hand insights for materials science. Discover opportunities for research on nanomaterials, batteries, additive manufacturing and more.
- Batteries: When you strive to optimize batteries with respect to longterm stability and life time, it is important for you to have good simulations. And as precise models need accurate knowledge of components like active electrode particles you may turn to EBSD analytics and find yourself confronted with the issue to not being able to extract EBSD signals out of your specimen at all, not to talk about covering the complete sample volume.
- Photovoltaics: Interrogate advanced layered structures e.g. in solar cells in order to advance their efficiency. Desirable for you is gaining spatial elemental distribution at the nanometer scale and depth profiles of around 20 nm. Conventional EDS is not an option. And now you are looking for a suitable technique.
- Metals and Semiconductors: Analyze deeply buried, site-specific structures with nanoscale resolution for research into semiconductor package technologies. Avoid creating artifacts in your analysis area while achieving unprecedented speed.
- Geosciences: When you are investigating geological specimens and you need to observe smaller features you are facing a challenge. Currently, chemical information for minute structures is difficult to access due to technical limitations.
ToF-SIMS for Crossbeam, time of flight SIMS, allows you interrogate multi-layered systems at the nanometer scale. Analyze trace elements, light elements (e.g. lithium), and isotopes. Profit from sensitive and comprehensive analyses in 3D. Perform elemental mapping and depth profiling. Benefit from parallel detection of atomic and molecular ions down to the ppm level. Achieve resolutions better than 35 nm in lateral direction and 20 nm in depth.
SIMS for ORION NanoFab enables you to achieve SIMS maps with resolutions of less than 15 nm routinely. Use the neon beam to sputter secondary electrons or ions from the sample surface. To get a mass spectrum, either ramp up the magnetic field while keeping the detectors fixed or fix the magnetic field and move the detectors. Perform imaging by spatially mapping up to four selected species over a specific analyzed area. Get a depth profile that shows the distribution of selected elements or molecular fragments as a function of depth. Accomplish 3D imaging by executing spatial mapping over a specific analyzed volume.
Massive material ablation on samples like a 2.5/3D TSV multi-chip package using a femtosecond laser provides rapid access to deeply buried structures while minimizing sample artifacts. Augmenting your ZEISS Crossbeam with a femtosecond laser enables you to perform multiscale analysis with exponentially faster results, compared with using a plasma ion source, for the preparation of very large samples. Read this study about intermetallic compounds (IMC) and grain structure to learn more about the advantages of Femtosecond Laser
With ZEISS Atlas 5 and its Analytics module on your Crossbeam you are able to analyze battery components. Take advantage of the true z slice thickness tracking feature, included in the 3D tomography module of Atlas 5. Use the Analytics Module to enable high resolution 3D SEM imaging and 3D EBSD mapping using two different sets of SEM and EBSD conditions that are optimized for each task. Tailor the spatial increments for images and maps independently of each other and set up the best landing energies using a workflow which will then switch automatically between imaging and EBSD analysis.
Get in touch with us to get to know how ZEISS Crossbeam, ORION NanoFab, Atlas 5 and the SIMS technique / Femtosecond Laser benefit your specific research challenges or facility, book a demo at our customer center, or get a quote. We are looking forward to hearing from you.