FIB-SEM Upgrades

Analyze your sample through a wide range of different detectors. Different detectors allow you to receive various types of information about the surface, composition and other details which will help you to improve and ease your processes

Add transmitted electron imaging capability to your FE-SEM or Crossbeam system. Get additional information out of your ultrathin biological or solid-state specimens without need to use a dedicated Transmission Electron Microscope and enjoy flexibility and versatility.

The Energy selective Backscattered (EsB) Detector is suitable for clear compositional contrast. It is an annular shaped incolumn detector that is located above the In-lens detector. The ability to detect BSE makes sub-surface information and nano-scale composition visible.

The Secondary Electrons Secondary Ions (SESI) Detector is a new type of detector available for Crossbeam workstations. This detector allows the acquisition of FIB secondary ion images or electron images.

The BSD4 detector is used to detect backscattered electrons that have been scattered under very low angles. The COMPO-Mode is suitable to produce high quality material contrast, meaning heavy materials are displayed brighter than lightweight materials.

Rapid imaging with the desired resolution requires high electron doses and acceleration voltages, which can cause charging effects and sample damage that compromise image quality. ZEISS Sense BSD combines high-resolution ultrastructural imaging with a new degree of efficiency and image quality, making TEM-like imaging possible with your SEM.

The BSD-Detector is used to detect backscattered electrons, that have been scattered under very low angles. The new amplifier provides higher detector efficiencies and delivers a variety of contrast information, much higher gain and a lower noise level.

Get more information about the Focused Ion Beam (FIB) and benefit from full sputtering capability and micro- and nano-machining tool functionality. The Gas Injection System (GIS) allows you a deposition of various materials on the specimen. Use the FIB-SIMS to analyze the composition of solid surfaces and thin films and receive detailed information through in-situ lamella viewing with the Micromanipulator

Combine imaging and analytical performance of your Gemini column with the ability of a next generation Focused Ion Beam (FIB). Benefit from full sputtering capability and micro- and nano-machining tool functionality of a FIB upgrade.

The Single/Multi GIS allows to inject a process gas on the specimen surface for electron beam- or ion beam induced deposition of metals and insulators.

ZEISS UniGIS (GIS = Gas Injection System) is a new single gas injection system used for ion or electron beam induced deposition (IBID /EBID) of precursors such as platinum, tungsten or carbon with ZEISS FIB-SEM systems.

FIB-SIMS is a very powerful surface analytical technique especially for high sensitivity nano-scale materials analysis. Elemental detection limits range from parts per million to parts per billion. Generate elemental surface, image and depth profile information by mass spectrometry.

Reduce the cleaning effort for the beam path components as well as the contamination of the protective window. Benefit from an easy removal of the cross-jet nozzle assembly for cleaning which will also enable loading high EBSD holders through the laser preperation chamber.

Create structures in nanometer range by either removing or applying surface material and using different systems (e.g. Atomic Force Microscope), or benefit from multi-modal images and comprehensive multiscale with the various options of ZEISS Atlas 5

The Atomic Force Microscope adds calibrated, atomic-level, 3D resolution and high resolution measurements to the existing SEM functionalities.

ZEISS Atlas 5 makes your life easier: create comprehensive multiscale, multi-modal images with a sample-centric correlative environment.

Explore our latest software versions and extended functionality through license options as well as the current recommended high performance PC-Hardware to optimize your systems performance

The ZEISS Workstation upgrade improves the daily process by using the latest SmartSEM software, high performance hardware specification and latest operating system.

SmartSEM is an operating system for electron microscopes that provides access to advanced microscope settings, designed to solve even the most challenging tasks.

Add new and improve existing functionality through our broad range of licenses which will help you to improve your processes, ease the use of your system and have tools to receive more information.

With Shuttle & Find you connect your electron microscope and light microscope from ZEISS. The combined hardware and software solution enables you to transfer your specimen from one microscope system to another within just minutes.

Increase your convenience and facilitate your work routine e.g. reduced loading time and increased sample throughput through the Airlock or a significantly reduced noise level through the Vac Quiet Mode. Decontaminate your specimen and chamber with the Plasma Cleaner or improve image quality through the compensation of charging effect with the Flood Gun or the Charge Compensation

The airlock allows efficient loading of samples without breaking the existing vacuum and thus reducing the risk of contamination of the sample chamber. By using this method sample exchange time is also significantly reduced.

The Charge Compensation system offers localized discharging of non-conductive specimens by ionization of nitrogen. High resolution combined with an additional expansion of analytical capabilities are, with the integration of a Charge Compensation system, not restricted to conductive samples only but can also be executed for all kinds of non-conductive samples.

The Flood Gun is an enhanced device for charge neutralization on positive charged insulator or semiconductor specimens. It provides a steady flow of low-energy electrons to discharge an area on the sample where the focused ion beam has left a net positive charge.

ZEISS offers you a fast and cost-efficient solution for specimen and chamber decontamination. A Plasma Cleaner is used to generate reactive gas-phase radicals in a plasma. The radicals migrate into the instrument chamber and chemically react with the unwanted hydrocarbons.

By using Vac ECO Quiet Mode and with help from a vacuum reservoir the pre-pump is automatically switched off after reaching a factory pre-set vacuum level. The vacuum reservoir allows the system to be operated for hours without the need of the pre-pump. This results in both the reduction of noise levels and energy consumption.

Upgrade your microscope with additional accessories such as sample holders, the latest version of our dual joystick controller and control panel or an Uninterruptible Power Supply (UPS) which ensures the safety of your system in case of a power failure

An Uninterruptable Power Supply (UPS) will be used if there is no steady supply of electrical power possible. It is designed to bridge short power failures and to shut down the microscope in a controlled manner during longer power failures.

With the Dual Joystick Controller and the Control Panel installed, operating becomes much more comfortable. The Dual Joystick Controller can be used for stage control and specimen navigation and the Control Panel gives you easy access to the most frequently used functions of the SEM.