ZEISS Xradia 410 Versa

Xradia 410 Versa bridges the gap between high-performing X-ray microscopes and less powerful computed tomography (CT) systems. Delivering non-destructive 3D imaging with industry best resolution, contrast, and in situ capabilities, Xradia 410 Versa enables you to achieve groundbreaking research for the widest range of sample sizes. Enhance imaging workflows with this powerful, cost-efficient "workhorse" solution, even in diverse lab environments.

Ask your ZEISS contact about ZEISS Xradia 410 Versa now!

Xradia 410 Versa X-ray microscope delivers cost-efficient, flexible 3D imaging to enable you to address a wide range of samples and research environments. Non-destructive X-ray imaging preserves and extends the use of your valuable samples over time. The instrument achieves 0.9 μm true spatial resolution with minimum achievable voxel size of 100 nm. Advanced absorption and phase contrast (for soft or low-Z materials) provide you with more versatility to overcome the limitations of traditional computed tomography (CT) approaches.

Xradia Versa solutions extend scientific research beyond the limits of projection-based micro- and nano-CT systems. Where traditional tomography relies on a single stage of geometric magnification, Xradia 410 Versa features a unique two-stage process based on synchrotron-caliber optics. It is easy to use, with flexible contrast. Breakthrough Resolution at a Distance (RaaD) enables you to maintain submicron resolution across a broad spectrum of sample dimensions in native environments and within a wide range of in situ rigs. Non-destructive multi-length scale capabilities allow you to image the same sample across a wide range of magnifications, making it possible to uniquely characterize the evolution of material microstructure properties between sequential treatments (4D) or as they are subjected to simulated environmental conditions (in situ).

Additionally, the Scout-and-Scan control system enables an efficient workflow environment with recipe-based set-up that makes Xradia 410 Versa easy for users with a wide variety of experience levels.

Ask your ZEISS contact about ZEISS Xradia 410 Versa now!

Xradia Versa architecture uses a two-stage magnification technique to enable you to uniquely achieve resolution at a distance (RaaD). Enlarge sample images through geometric magnification as with conventional micro-CT. In the second stage, a scintillator converts X-rays to visible light, which is then optically magnified. Reducing dependence upon geometric magnification enables Xradia Versa instruments to maintain submicron resolution at large working distances. This enables you to study the widest range of sample sizes effectively, including within in situ chambers.

• Non-destructive 3D imaging to preserve and extend the use of valuable samples
• High spatial resolution down to <0.9 µm and voxel size to 100 nm
  
• Advanced contrast solutions for low Z materials and soft tissue
• Industry-leading 4D and in situ capabilities for flexible sample sizes and types
• Scout-and-Scan™ control system for easy-to-use workflow set-up, ideal in multi-user environments
• Heavy load sample stage and extended source and detector stage travel
• Minimal need for sample preparation
• Easy navigation through multiple magnification detector system
• Continuous operation through automated multiple point tomography and repetitive scanning
• High speed reconstruction
• Optional Versa In Situ Kit organizes the facilities that support environmental chambers (such as wiring and plumbing) to enable maximum imaging performance and ease set-up while delivering the highest 3D resolution for in situ applications 
• Autoloader option enables you to program and run up to 14 samples at a time to maximize productivity, automate workflows for high volume scanning

Materials Research
Image and quantify microstructure evolution in 3D and 4D (time-based). RaaD enables resolution to be maintained for imaging within in situ rigs, including sub-interior regions of your samples, across a large variety of material types and sizes.

Raw Materials
Characterize and quantify porosity and micro rock structures to achieve the most accurate 3D submicron characterization of rock pore network for “digital rock” simulations and in situ multiphase fluid flow studies. Use X-ray vision to understand crack propagation in ceramics, metals and building materials. Perform quantitative, high resolution, three-dimensional microstructural analysis of relatively large samples at high resolution in situ.

Life Sciences
Characterize specimens in high definition for developmental biology, virtual histology and neural network mapping. High contrast detectors coupled with phase contrast imaging deliver unprecedented cellular-level detail.

Electronics
Image failures and microstructural detail in 3D, navigate to a location anywhere within intact sample, perform non-destructive virtual cross sections on large boards and advanced 3D packages. Xradia Versa offer the industry’s highest resolution, non-destructive solution for 3D submicron imaging that complements or replaces physical cross sectioning methods.

All of the features on the Xradia 410 Versa are seamlessly integrated within the Scout-and-Scan Control System, an efficient workflow environment that allows you to easily scout a region of interest and specify scanning parameters. The easy-to-use system is ideal for a central lab-type setting where your users may have a wide variety of experience levels. The interface maintains the flexibility for which Xradia Versa systems are known, enabling you to set-up scans even more easily. Scout-and-Scan software also offers recipe-based repeatability, which is especially useful for your in situ and 4D research, and enables you to have greater control and efficiency for future work.

New on Version 11:

• Automated Vertical Stitching capability sets a new industry standard for imaging tall samples at the push of a button. Combine Wide Field Mode with Vertical Stitching to join separate tomographies into a large seamless image, significantly expanding your field of view for samples that are both wider and taller.
• New Auto Reference provides you with the ability to move in the Z+ or Z- directions as well as the existing X and Y directions, ideal for imaging high aspect ratio samples such as PC boards.
• Adaptive Motion Compensation is a new method to compensate for sample drift that may during the course of a tomography, such as with soft samples.
• The new Reconstructor Scout-and-Scan application pairs with the versatile Automatic Reconstructor to provide added flexibility for data reconstruction.
• The new Enhanced Histogram capability allows you to incorporate color palette and log scaling for better data visualization .
  
  

Product Flyers, Technical Notes and Application Notes