Part of the ZEISS Microscopy Customer Center (ZMCC) Skill Builder Series


Excel on your EVO SEM

February 23 - 24, 2022

This virtual workshop will cover methods and supporting theory to enable attendees to become more comfortable and competent operating their ZEISS EVO SEMs under varying conditions and sample types. Some prior SEM imaging background will be helpful but not required to attend. It is recommended that attendees secure time on their instruments after the workshop sessions to apply the shared methods on their own challenging samples. Attendees are strongly encouraged to share their images from individual sessions and interact with our Applications team through independent email threads for further optimization.

This is a two-day online workshop consisting of two sessions split over two days, streamed live from the ZEISS EVO 15 SEM (LaB6) located at the ZEISS Microscopy Customer Center (ZMCC) in Dublin, CA. Through screen-sharing from the instrument and multiple cameras, the complete operation of the instrument will be visible as our SEM Application experts cover a full itinerary of training topics as detailed below.

Topics that will be covered in this workshop include:

Optimizing EVO 15 SEM (LaB6 filament)
  • Gun Alignment: Tilt and Shift
  • Aperture Selection and Alignment: Mechanical and Electronic
  • Astigmatism Correction
  • Focus
Varying Imaging Conditions
  • kV/Aperture/Probe Current or Spot Size/Imaging Modes: High-Resolution/Depth/Analytical
  • High vacuum and variable pressure operation using conductive, non-conductive, and beam sensitive materials
  • Utilizing different image collection conditions (line average, line scan, point, and drift correction)
  • Detectors: SE/BSD/VPSE/CD2/C2DX
Theory: Beam/Sample interaction/High Vacuum vs Variable Pressure
Mechanical insertion and removal of HDBSD detector/updating SmartSEM of this change
High vacuum vs. EasyVP apertures
NavCam Registration and Troubleshooting
  • Customizing data zone and toolbar
  • Basic macros
  • Horizontal align
  • New user accounts and or changing permissions/Enabling stage safety limits

After the workshop sessions, the attendees are strongly encouraged to attempt the methods shown on their own systems with their own challenging samples and share their images with the applications team through independent email threads. Our support team will assist in further optimization and answer any questions to help attendees acquire the best data possible.

Who should attend?

  • Existing users of ZEISS EVO SEMs (EVO 10, EVO 15, EVO 25, and older model EVOs)
  • Infrequent SEM users in need of a refresh of theory and techniques related to low-kV imaging, imaging of non-conductive or beam sensitive samples, or variable pressure imaging
  • Lab managers or technicians looking to improve their own skill level to better support and/or train other users of the instrument

Learning Objectives

After completion of this workshop, attendees should

  • Have an improved understanding of how beam-sample interaction, parameter selection, and sample preparation and cleanliness will influence the information acquired with their SEM
  • Possess an improved ability to select imaging parameters to yield high-quality images of their samples
  • Be connected with the North American Applications team who can support them as they work towards acquiring the best data possible

This is a paid workshop.
Spots are limited.
Access to a SEM after each day is strongly recommended to apply lessons learned and share results with applications team for further support.
Registration Deadline: Wednesday, February 16, 2022