This workshop will cover theory and methods to achieve high-spatial resolution, surface-sensitive imaging on ZEISS GeminiSEMs. Focus will be set on samples that are challenging to image, such as those that are not conductive or are susceptible to beam damage. Prior SEM imaging background will be helpful as we will cover topics such as low-kV beam settings and variable pressure imaging. It is recommended that attendees secure time on their instruments after the workshop sessions to apply the shared methods on their own challenging samples. Attendees are strongly encouraged to share their images from individual sessions and interact with our applications team through independent email threads for further optimization.
This is a two-day workshop with four and a half hours for the first day and three and a half hours for the second day. Breaks will be scheduled for each day.
- Review of Theory: Beam-Matter Interaction, Charge Balance and Sample Prep/Cleanliness
- Operation on GeminiSEM 300: Varying kV with large focus on low-kV imaging at higher resolutions across conductive, non-conductive, and beam sensitive materials
- Review of Theory: Variable Pressure imaging and nanoVP
- Operation on GeminiSEM 300: Imaging non-conductive samples within Variable Pressure mode
- Operation on GeminiSEM 460: Gathering surface sensitive data on non-conductive samples with nanoVP and inLens detection
After the workshop sessions, the attendees are strongly encouraged to attempt the methods shown on their own systems with their own challenging samples and share their images with the applications team through independent email threads. Our support team will assist in further optimization and answer any questions to help attendees acquire the best images possible.
- Existing users of ZEISS FE-SEMs (GeminiSEMs, Sigmas, Ultras, Merlins, and Supras) and FIB-SEMs (Crossbeams and Aurigas)
- Infrequent SEM users in need of a refresh of theory and techniques related to low-kV imaging, imaging of non-conductive or beam sensitive samples, or variable pressure imaging
- Lab managers or technicians looking to improve their own skill level to better support and/or train other users of the instrument
- Have an improved understanding of how beam-sample interaction, parameter selection, and sample preparation and cleanliness will influence the information acquired with their SEM
- Possess an improved ability to select imaging parameters to yield high-quality, surface sensitive images of their samples
- Be connected with the North American applications team who can support them as they work towards acquiring the best data possible