Microscopy Workshops

Electron Microscopy

ZEISS EVO SEM Series Workshop

December 5-7, 2017 - ZEISS Microscopy Customer Center New York

Learn SEM fundamentals and get hands on training with the EVO SEM series from ZEISS. Click on the tabs below for an outline of the 3-day workshop and to register for the workshop. Space is limited.

Day 1: SEM Fundamentals

We will begin with a review of some fundamental principles to ensure that each user understands the effects of changing SEM parameters such as accelerating voltage, probe current and working distance on image quality. We will review beam formation, beam-specimen interactions, specimen charging and the selection of detectors in image formation.

The time required for this workshop will depend on the user’s background; it can be omitted or abbreviated for users with previous SEM experience.

Operation of SEM will include a physical description of the instrument, powering the instrument, logging-on and components of the Graphical User Interface (GUIF) and screen display.

We will perform a normal gun run up and do a complete system check of all beam and detector functions. Topics in this session will include aperture selection, parameter adjustments with the mouse, joystick, control panel, keyboard and tool bar icons functions. We will also examine magnification-focus, brightness-contrast, and scan rate and astigmatism correction.

The following fundamental operating modes will be covered:

  • High resolution low probe current imaging
  • High depth of field
  • Low voltage imaging in high vacuum
  • Backscatter electron detection (both compositional and topographic imaging)
  • Variable pressure imaging using the backscatter and VPSE detectors (if applicable)
  • CL Imaging with VPSE detector
  • Optibeam EZ-VP Mode (new to 2014 models)
  • Beam Deceleration (new to 2014 models)

Details of the user interface will be introduced along with some extensive software selections. These include help topics, pre-defined lists, annotation, toolbar icons, pull down menu functions, dialog panels including stage navigation, safe navigation and image navigation dialogs. Exporting and importing images, zone control and user defined preferences will be discussed and practiced along with printing images and image store resolution. Selected advanced features of the SmartSEM software will be introduced such as the tool bar editor, hot keys, macro editor, image processing and stage functions.

Late in the afternoon we will change the tungsten source to LaB6 (when applicable). Enabling the ion getter pump (IGP), bake-out and the gun monitor will be reviewed.

Day 2: Hands-On Session and Troubleshooting

Our morning will begin with a review of day one material along with a discussion of normal gun run up and systematic check of the SEM functions. The user will run the SEM and practice what was previously introduced. Resolution and image quality associated with SEM parameter changes and specimen interaction will be reinforced.

Mid-morning we will cover changing tungsten and LaB6 filaments as well as specific gun run up and alignments. We also cover trouble-shooting, cleaning and replacing the fixed apertures.

The afternoon will be a hands-on session and a chance for users to pose specific questions while they run the instrument. This session may also allow imaging on customers’ samples if they are instructional for all.

Day 3: Wet Imaging Extended Pressure Session*

*Optional for Users of EVO MA Systems Without Water Vapor

The morning of day three is devoted primarily to extended pressure (EP) wet imaging but may also include one or more special topics. Wet imaging is specific to EVO LS systems or EVO MA systems with TTL and water vapor and may not be applicable to EVO systems without the water vapor option. Everyone is welcome and encouraged to attend the third day.

These are some special third day topics. Topics will vary depending on the group and availability of other instructors, if required.

  • Extended Pressure Workshop: Imaging hydrated samples in EP mode using peltier cool-stage.
  • Correlative Microscopy: Correlative Light and Electron microscopy with Shuttle & Find
  • Remote SEM: Remote operation of the SEM using Webex, UltraVNC and other shared desktop applications.
  • SEM Automation: ATLAS, ATLAS Array Tomography, SmartStitch & or Automated Intelligent Imaging Software: Automated unattended image acquisition and mosaics.
  • Automated Particle Analysis: Introduction to SmartPI.
  • STEM Imaging: Low voltage scanning transmission electron microscopy with the SEM.
  • EVO Advanced Maintenance & First Level Service: Taught by ZEISS Technical Support Specialist leader.
  • Introduction to Light Microscopy: Taught by ZEISS LM Imaging Specialists
  • Quantitative x-ray microanalysis: Taught by invited OEM applications staff
  • Biological Sample Preparation for SEM

Register for the workshop

EVO SEM Series Workshop

Date5 December 2017 - 7 December 2017
StatusRegistration: Open
Registration deadline4 December 2017
LocationZEISS Microscopy Customer Center New York
1 Zeiss Drive
Thornwood, NY 10594
DescriptionRegistrants may apply a new instrument training credit for this course or a quote will be provided following registration. Course tuition is $1,950 for 2-day courses and $2,950 for 3-day courses. Training credits and tuition do not include travel expenses and accommodation.
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