Microscopy Workshops

Electron Microscopy

FE-SEM Series Workshop - April

ZEISS FE-SEM Series Workshop

April 9 - 11, 2019 - ZEISS Microscopy Customer Center New York

Learn FE-SEM fundamentals and get hands on training with ZEISS FE-SEM. See below for an outline of the 3-day workshop and to register for the workshop. Space is limited.

Day 1: SEM and FE-SEM Fundamentals

Operation of the ZEISS Field Emission Scanning Electron Microscope:

The workshop will begin with a review of some fundamental principles to ensure that each user understands the effects of changing parameters such as accelerating voltage, probe current and working distance on image quality. We will review GEMINI column optics, beam formation, beam-specimen interactions, specimen charging and the selection of detectors in image formation.

This session will begin with a physical description of the instrument, powering the instrument, logging-on and components of the SmartSEM Graphical User Interface (GUIF) and screen display. We will begin with a practical evaluation of basic instrument performance with a resolution check using Au on C standard.

Additional topics in this session will include parameter adjustments with the mouse, joystick, control panel, keyboard and tool bar icons functions. This session will also cover normal gun run up, aperture selection, high current mode and selecting beam parameters as well as restoring and saving SEM states and stage positions. Parameter adjustments of magnification-focus, brightness-contrast, and scan rate and aperture alignment and astigmatism correction will also be covered. The following fundamental operating modes will be covered:

  • Imaging with Everhart-Thornley & InLens SE detectors
  • Ultra-low kV high resolution imaging
  • Backscattered Electron Imaging
  • Compositional, topographic and channeling contrast imaging with aBSD4 and AsB below lens solid state detectors
  • High resolution low voltage compositional imaging with In-Column EsB detector

During the course of the day we will cover all aspects of the user interface and introduce some of the extensive software features including administrative functions, help files, pre-defined lists, annotation, toolbar icons, pull down menu functions, dialog panels including Stage Navigation, Safe Navigation and Image Navigation.

Day 2: Hands-on Session and Troubleshooting

Day 2 will begin with a review of the material presented on the first day giving users a chance to pose specific questions. This will be followed by a hands-on session. The user is encouraged to run the FE-SEM and practice some of what was previously introduced. Resolution and image quality associated with SEM parameter changes and specimen interaction will be reinforced. This session may allow for imaging on customers’ samples.

These additional topics can and will be inserted at any time:

  • Variable pressure imaging using backscatter and variable pressure VPSE detectors
  • VP imaging- VP, NanoVP, XVP
  • Multi-Mode STEM imaging of nanoparticles and stained ultra-thin sections
  • Advanced macro writing and automation of the FE-SEM
  • Tandem Beam Deceleration on Gemini SEM systems
  • Large Area Microscopy
  • ATLAS SEM Visualization Engine
     

Day 3: Hands-on Session

Optional 3rd Day for Advanced Hands-on Operation.

FE-SEM Series Workshop

Date9 April 2019 - 11 April 2019
StatusRegistration: Open
Registration deadline8 April 2019
LocationZEISS Customer Center New York
One Zeiss Drive
Thornwood, NY 10594
DescriptionRegistrants may apply a new instrument training credit for this course or a quote will be provided following registration. Course tuition is $1,950 for 2-day courses and $2,950 for 3-day courses. Training credits and tuition do not include travel expenses and accommodations.
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