This year ZEISS successfully introduced a Particle Removal Tool (PRT) to the market. The tool solves three customer problems: It offers an exceptional imaging performance for SEM review, high resolution material analysis (EDX) and it removes soft defects from photomasks.
We are pleased to report, that the novel technology convinced the first customers. The very first shipment is scheduled for beginning of 2021 already. Further shipments will follow throughout the year.
“We are excited that there is such a high interest in the PRT. We are looking forward to install our first system at customer site soon”, states Dr. Markus Waiblinger, Product Manager PRT. “Additionally, our demo schedule will keep us very busy for the next months, which is great.”
With different customers and partners the PRT Team evaluates the application space of the PRT. “It is amazing what is possible, if you think out of the box”, explains Markus Waiblinger. “We have removed particles from EUV pellicles, can remove tin particles coming from the EUV source quite well and expect that the tool can also be used in the EUV blank production.”
The PRT complements the existing ZEISS mask repair portfolio. PRT repairs so called soft defects (particles), whereas the e-beam based MeRiT® systems focuses on hard defects.
The system combines a SEM, an EDX and a nano-manipulator. Compared to existing technologies, it follows a “what you see is what you get” approach. It is fast, flexible and can be used for 193nm, and EUV masks, blanks and EUV pellicles.