Monitor with automation program running

Digital Solutions For higher productivity, cycle time reduction and reliability improvement

ZEISS offers several automation applications running on the FAVOR® computational engine. FAVOR® solutions enhance productivity and reliability through intelligent automation and enabling technologies. Significant time savings and an improved reliability result from reduction of manual steps and human error. Modular applications provide solutions to specific manufacturing needs.

Down below you find the variety of system boosting software programs:


Scientific Papers publications written by ZEISS authors

SEM AutoAnalysis for reduced turnaround time and to ensure repair quality of EUV photomasks

With the semiconductor industry tending towards adding multiple layers consisting of EUV technology in high-end manufacturing and the production of many EUV scanners to meet customer demands, novel approaches for EUV defect review are being readil...

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On the road to automated production workflows in the back end of line

The technical roadmap adopted by the semiconductor industry drives mask shops to embrace advanced solutions to overcome challenges inherent to smaller technology nodes while increasing reliability and turnaround time (TAT). It is observed that the...

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The impact of the reticle and wafer alignment mark placement accuracy on the intra-field mask-to-mask overlay

The mask-to-mask writing error contribution as part of the on-wafer intra-field overlay performance has been extensively studied over the past few years. An excellent correlation (R2 > 0.96) was found between the off-line registration measurements...

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integrated microchip

AIMS® AutoAnalysis Full automation of data analysis

AIMS® AutoAnalysis runs independently from tool software, allowing the AIMS® tools to be dedicated for measurements only while the analysis runs in parallel. It optimizes processes as it improves productivity, saves operator time and standardizes results. The computer performance is optimized for the application. All relevant AIMS® system generations are supported. Up to 40% back end of line process time per mask can be saved, therewith the software contributes to overall process flow improvement. Operators have more spare time and can focus on more critical work.

AIMS® AutoAnalysis EUV Automation for AIMS® EUV

AIMS® AutoAnalysis EUV extends the automated defect verification to the segment of high-end EUV mask manufacturing. Parallel processing allows for high throughput and sophisticated analysis algorithms for evaluation of even the smallest EUV structures. Extended standardization, realized by a recipe and template based approach, also enables to run DUV processes identically for EUV mask making. 

Daten Transfer Highway Infrastruktur 2

SEM Auto Analysis SAA automatically analyzes SEM images

SEM AutoAnalysis extends the AIMS® AutoAnalysis solution available for the back end of line of mask manufacturing. With its production proof concept it brings automation to the evaluation of SEM based images resulting in increased reliability, less variability and finally a reduction of turnaround time. Moreover, mask makers can harness more information from already existing SEM data. This adds more credibility to the defect-qualifying step.

Advanced Repair Center ARC optimizes BEOL productivity

The Advanced Repair Center ARC is capable of connecting tools and software products in a smart way. It is a back end of line manufacturing enterprise solution that targets productivity, costs saving and shorter turnaround time through the use of intelligent automation. Built on the connectivity provided it facilitates data management and process flow optimization for the entire defect handling process. That significantly reduces the required amount manual interactions and makes processes less prone to human errors resulting in increased reliability.

Video about the Advanced Repair Center ARC

MeRiT® AutoAnalysis MAA increases productivity

MeRiT® AutoAnalysis MAA provides a fully automated analysis solution for photomask repair workflows on MeRiT®. Independent of the tool software, pre and post repair SEM images can be analyzed in parallel to other activities which leads to significant time savings. Apart from the availability of the analysis history in one single place, the application offers sophisticated analysis strategies compatible with high end EUV mask repairs. High sensitivity to defect detection ensures quality targets and prevents users to overlook required repair rework.

NEW: Video about MeRiT® AutoAnalysis MAA

Local Registration Map Deviations measuring at a large scale

The Local Registration Map LRM is a PROVE® application, which allows to perform dense local registration measurements at unprecedented spatial resolutions with significantly improved throughput. Amongst applications such as sophisticated Overlay prediction the LRM functionality is a key enabler for new calibration schemes for state-of-the-art e-Beam writers (VSB and MBMW).

printed circuit boards

ForTune Tuning Module FTM simulates jobs and generates recipes

The ForTune Tuning Module software package facilitates recipe creation as well as extensive data analysis and simulations prior to the ForTune process (CDC & RegC® applications). This module’s versatile job handling capabilities ensure high process efficiency, superior prediction accuracy and on-the-spot decision making. 


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