Photomask repair solutions

Photomasks featuring zero printable defects with ZEISS MeRiT systems

Scaling trends towards smaller technology nodes and feature sizes are continuing and EUV technology is becoming increasingly important in the semiconductor industry. Associated complexity in mask manufacturing raises significantly and with them the necessity to repair defective high end photomasks. With MeRiT® photomask repair systems ZEISS offers optimized solutions based on leading edge technology for the repair of high end photomasks enabling the repair of smallest new generation defects on every type of photomask.

Journal of Micro/Nanopatterning, Materials, and Metrology Vol. 20 · No. 4 | October 2021

New scientific paper on Mask defect detection with hybrid deep learning network published. Authors: Peter Evanschitzky, Nicole Auth, Tilmann Heil, Christian F. Hermanns, Andreas Erdmann


High precision e-beam mask repair

ZEISS MeRiT systems represent the state-of-the-art tools for repair of high-end photomask based on focused electron beam induced processing. The systems enable the repair of ultra-small defects by high-end electron beam columns optimized for lowest energies. Transparent and opaque defects of many different geometries on binary, phase-shift nanoimprint templates and EUV masks can be repaired. The modular software of the system in conjunction with the pattern copy feature delivers highest degree of automation. The recipe based operation provides a high flexibility and allows user specific extensions for upcoming mask types. 

Down below you find the variety of the current MeRiT® systems:


Low energy technology for ultra-small defects

ZEISS MeRiT LE represents the next generation repair tool for high-end photomasks, particularly focusing on EUV repairs. It features a decreased minimum repair size and improved edge placement accuracy to address the increased number and complexity of pattern defects on high-end photomasks. The re-designed tool platform is based on focused electron beam induced processing and provides highest repair resolution. It is equipped with a new electron beam column optimized for lowest electron energies and improved serviceability.

How to repair high-end EUV photomasks Watch the new video about ZEISS MeRiT LE

MeRiT® neXT State-of-the art e-beam photomask repair

ZEISS MeRiT neXT tool is the industry standard for high-end photomask repairs. By using ZEISS electron beam columns it enables the repair of smallest defects on many different types of photomasks. Clear and opaque defects can be repaired based on exposure with focused electron beams and adsorption of precursor molecules.

Digital Solutions Running on the computational engine FAVOR®

The FAVOR® platform enables productivity and reliability enhancement through intelligent automation. ZEISS offers several automation applications. All listed solutions are supported by the MeRiT® technology.

SEM AutoAnalysis (SAA)

SEM AutoAnalysis extends the AIMS™ AutoAnalysis solution available for the back end of line of mask manufacturing. With its production proof concept it brings automation to the evaluation of SEM based images resulting in increased reliability, less variability and finally a reduction of turnaround time. Moreover, mask makers can harness more information from already existing SEM data. This adds more credibility to the defect-qualifying step.

Advanced Repair Center (ARC)

The Advanced Repair Center is a completely new category of products capable of connecting tools and software products in a smart way. It is a back end of line manufacturing enterprise solution that targets productivity, costs saving and shorter turnaround time through the use of intelligent automation. Built on the connectivity provided it facilitates data management and process flow optimization for the entire defect handling process. That significantly reduces the required amount manual interactions and makes processes less prone to human errors resulting in increased reliability.

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ZEISS MeRiT Product Family Brochure

ZEISS MeRiT Product Family
pages: 9
file size: 3,121 kB

Future Photomask Repair
pages: 4
file size: 0,396 kB


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