Wafer Fabs highly depend on predictability and credibility. Achieving high yields is essential to convince their customers of the capability of the fab. Any process excursion that reduces the yield significantly undermines the trust of the customer into the fab’s capability and reliability. ZEISS offers an innovative solution preventing excursion and improving the Wafer On-Product-Overlay (OPO).
ZEISS ForTune improves wafer intra-filed litho parameters by mask tuning in high lateral resolution on top of any other available solution in the market and in low cost. It is available for all market segments (Memory - DRAM, 3D NAND, XPOINT, and Logic) and covers two main areas.
ZEISS ForTune improves high frequency wafer On Product Overlay (OPO) by correcting the scanner delta lens fingerprint or reducing wafer intra-field overlay.
The probability of process defects caused by wafer intra-field CDU can be reduced applying ZEISS ForTune. Following the excursion prevention strategy increases thereby wafer yield.
With its latest optical design ZEISS ForTune takes the two main tuning applications to the next level in terms of efficiency, accuracy and throughput. Using an ultra-short pulse laser technology allows to change the optical and mechanical properties of the shading elements and thereby to improve wafer intra-field CDU as well as mask registration. The optimization of intra-field CDU by mask tuning provides the ability to control the wafer intra-field CDU and improve the wafer On-Product-Overlay (OPO).
ZEISS ForTune comprehensive software suite allows the users to predict the specific process performance reliably and accurately before the actual process execution. Graphical outputs allow comparison of the initial problem with the predicted post process solution, including suitable statistics for the scanner compensation to be used later in HVM.
Type of file: mp4
File size: 189 MB
The FAVOR® platform enables productivity and reliability enhancement through intelligent automation.
FTM - ForTune Tuning Module
The Tuning Module software package has been developed for ZEISS ForTune to facilitate recipe creation as well as extensive data analysis and simulations prior to the ForTune process (CDC & RegC® applications). This module’s versatile job handling capabilities ensure high process efficiency, superior prediction accuracy and on-the-spot decision making. The Tuning Module runs on ZEISS FAVOR, a powerful computation engine capable and efficient to perfectly support the processing of the advanced algorithms.