The FAVOR® computation engine provides a flexible solution to improve data processing, automation and information flow within the mask shop. Several individual software applications function both as stand alone products and are fully integratable with one another through the FAVOR® framework, providing a powerful combination of data analysis and workflow enhancement across multiple tool platforms.
Even least defects in the layout of a single photomask can consign all chips on the exposed wafer resulting in enormous losses. That is why it is crucial to inspect all masks for defects, understand their impact on the photolithography process, and eliminate them before the mask is used in a stepper or scanner.
ZEISS has launched the new ZEISS MeRiT neXT system for repairing smallest next generation defects. With its low energy ebeam column the tool represents a paradigm shift in classical photomask repair.
With shrinking feature sizes in-die metrology is not only desirable, but essential as the measurement of test structures no longer reflects the complex interacting between patterns and illuminating light in the deep sub-wavelength regime.