Semiconductor Metrology Systems
innovationMADE BY ZEISS

Achieving excellent yield with connected mask solutions.

ZEISS Semiconductor Metrology Systems

innovationMADE BY ZEISS

Semiconductor Metrology Systems

Perfect Photomask Solutions

Since the photomask is one of the key elements in photolithography it deserves special care and attention. The strategic business group Semiconductor Metrology Systems (SMS) of ZEISS has many years of experience in qualification, repair and verification, metrology as well as tuning of photomasks. Together with the industry we are constantly developing complete systems and providing innovative technology for all relevant nodes.

We provide unique solutions for mask making and lithography in the areas of zero defect, in-die metrology, critical dimension/registration and overlay control to achieve high mask yield improvement and mask recovery.


Software Applications

For enhanced productivity and reliability

The FAVOR® computation engine provides a flexible solution to improve data processing, automation and information flow within the mask shop. Several individual software applications function both as stand alone products and are fully integratable with one another through the FAVOR® framework, providing a powerful combination of data analysis and workflow enhancement across multiple tool platforms.


Mask Qualification

Preventing defects from printing

Even least defects in the layout of a single photomask can consign all chips on the exposed wafer resulting in enormous losses. That is why it is crucial to inspect all masks for defects, understand their impact on the photolithography process, and eliminate them before the mask is used in a stepper or scanner.


Mask Repair: new techniques

New system for repairing smallest next generation defects

ZEISS has launched the new ZEISS MeRiT neXT system for repairing smallest next generation defects. With its low energy ebeam column the tool represents a paradigm shift in classical photomask repair.


Mask Metrology

Unique solutions to improve the critical dimension uniformity

With shrinking feature sizes in-die metrology is not only desirable, but essential as the measurement of test structures no longer reflects the complex interacting between patterns and illuminating light in the deep sub-wavelength regime.


Mask Tuning

Fortune your mask

Enhance the yield and increase productivity by tuning the mask and aligning mask properties such as registration, overlay and CD.

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