Mask Metrology

Perfect image placement, CD and phase measurement

The image placement remains an important aspect of photomask metrology. Not only the position accuracy of features for an individual mask – representing one layer in a complete chip design – have to meet stringent requirements. The complete mask set for all layers have to match in order toget a functional device.

With the introduction of multi pattering schemes most difficult layers in terms of critical dimensions have to be split into separate layouts and overlayed with each other. These tasks require registration metrology tools which employ high resolution capabilities and yet unprecedented specificationson reproducibility and accuracy for precise image placement measurements.

PROVE® Compact HS

High speed mask registration and overlay metrology

ZEISS PROVE Compact HS measures registration and overlay on photomasks with sub-nanometer repeatability and accuracy meeting the pattern placement requirements of all current technology nodes.

About ZEISS PROVE Compact HS

PROVE® HR

High resolution mask registration and overlay metrology

ZEISS PROVE HR  is designed for the calibration of Variable Shape Beam (VSB) as well as multi beam writers. ZEISS PROVE HR measures registration and overlay on photomasks with sub-nanometer repeatability and accuracy at indie features and metrology targets.

About ZEISS PROVE HR

WLCD

Wafer-level CD metrology on photomasks

With proven aerial imaging technology ZEISS WLCD measures the critical dimension (CD) on photomasks under scanner relevant illumination conditions with high throughput.

About ZEISS WLCD
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