High Resolution Photomask Registration and Overlay Metrology
The ZEISS PROVE Compact HS system measures registration and overlay on photomasks with high throughput. Sub-nanometer repeatability and accuracy meet your registration metrology requirements for todays and future nodes.
ZEISS PROVE Compact HS provides an outstanding imaging quality for all types of photomasks for measurements in reflection and transmission.
With excellent uptime it is the workhorse in all leading mask shops worldwide.