Wafer-level CD metrology on photomasks

  • Highlights

    The ZEISS WLCD measures the critical dimension (CD) on photomasks under scanner relevant illumination conditions with high throughput. Proven aerial imaging technology is used to qualify the printing performance of the mask.


    The WLCD system by ZEISS provides high precision in-die CD measurement, predicting wafer level photomasks performance. Actinic CD metrology is based on aerial imaging technology by high resolution 193 nm optics.



    Scanner equivalent illumination settings include FreeForm Illumination to support SMO technologies. ZEISS WLCD captures OPC and optical MEEF effects and simplifies CD measurements for complex mask designs. Pellicle capability allows fast mask qualification and performance monitoring.

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    ZEISS WLCD Flyer

    Automatic evaluation of the minimal and maximal CD within a ROI