High resolution registration and overlay metrology

  • Highlights

    ZEISS PROVE HR represents the leading edge tool for registration metrology on photomasks. It is the tool of choice for the calibration of latest generation Variable Shape Beam (VSB) as well as multi beam writers. Superior precision and resolution power support sophisticated double patterning schemes as well as the transition to EUV lithography.

  • More Information

    As with previous generation tools, ZEISS PROVE HR utilizes 193 nm illumination and a litho grade beam path with low aberrations optics for precise in-die measurements on production features.

    The high NA of 0.8 is well suited for investigating the resolution of critical features without compromising precision on all type of photomask including EUV, NIL and high durability (SiN based) absorber materials. For effective writer qualification, measurements in resist are supported as well.

  • Brochure

    Enter the quantity of brochure and add to order list. Continue browsing or complete your order. All ZEISS Photomask Solutions brochures are free. All brochures


    High Resolution Photomask Registration and Overlay Metrology

    Page(s): 9
    File size: 4,880 kB

We use cookies on this site. Cookies are small text files that are stored on your computer by websites. Cookies are widely used and help to optimize the pages that you view. By using this site, you agree to their use. more