25 Years of AIMS Technology

Happy Birthday

For 25 years the Aerial Image Measurement System AIMS™ from ZEISS is used for defect review, printability analysis andrepair verification. The system precisely qualifies photomasks according to its printing behavior.

Starting point

ZEISS AIMS was introduced in 1993. Today the systems are an integral part of the mask manufacturing process andguarantee the delivery of defect free masks to wafer fabs. Today the AIMS™ technology covers various nodes with different wavelengths.

Milestones

  • 1993: Arial Image Measurement Algorithm developed
  • 1994: first 365/248 nm ZEISS AIMS introduced to market
  • 1999: first 193 nm ZEISS AIMS delivered to the industry
  • 2006: first 193 nm immersion AIMS™ introduced to the market
  • 2017: first ZEISS AIMS EUV delivered to the customer

AIMS™ History

AIMS contact holes

1993

IBM develops Aerial Image Measurement Software

1994

Market launch of MSM 100 by ZEISS (365/248 nm wavelength)

MSM 193

1999

Market launch of the MSM 193 (193 nm wavelength)

2000

First fab tool – AIMS™ fab (248 nm wavelength)

2003

First fab tool with automatic handling system – AIMS™ fab plus

AIMS™ 45-193i

2006

AIMS™ 45-193i introduced

AIMS™ 32-193i

2009

AIMS™ 32-193i launched

AIMS™ 1x-193i

2014

AIMS™ 1x-193i (193 nm)

AIMS™ EUV

2017

AIMS™ EUV (13.5 nm)

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