Extreme ultra violet photomask qualification

  • Highlights

    The high volume device manufacturing infrastructure based on EUVL technology requires defect-free EUV mask manufacturing as one of its foundations. SUNY Poly SEMATECH initiated EMI, the EUV Mask Infrastructure program, which has identified an actinic measurement system for the printability analysis of EUV mask defects to ensure defect free mask manufacturing and cost-effective high-volume EUV production.

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