The industry platform for actinic EUV measurements, extendible with mask qualification applications beyond pure defect review

The ZEISS AIMS EUV actinic tool for review of EUV photomasks provides full emulation of the scanner imaging conditions for the NXE:33X0 EUV systems, with extension capability to NXE:34X0 generation systems. This emulation is achieved via an integrated chief ray angle rotation performed by a synchronous mechanical movement of the sigma and NA apertures.

AIMS™ EUV meets the industry production requirements by providing EUV scanner quality optics, a high precision stage for defect location accuracy and by employment of an EUV plasma source optimally designed for meeting metrology applications requirements.