ZEISS AIMS fab neo New System

ZEISS AIMS fab neo

Newly designed for 248 nm lithography

AIMS™ fab neo focusses on the needs of a mature market where process simplification and cost effective solutions are the main challenges. AIMS™ fab neo provides the capability to perform defect and repair verification for 248 nm masks and ensures hereby the delivery of defect free masks to the wafer fab.

ZEISS AIMS fab neo offers a completely new design. The beam path is improved by separating the UV beam path from the visible beam path ensuring a high reliability and enhanced serviceability. The illumination unit is equipped with an exchangeable slider which allows a predefinition of up to 21 user definable sigma apertures. This ensures an easy switch of illumination schemes during operation.

The Graphical User Interface was completely redesigned and allows an ease of use operation of the system, but maintaining the well established operator workflow. The overall productivity can be further improved by utilizing the AIMS™ AutoAnalysis (AAA) option which provides completely automated defect analysis in parallel to the measurement.

AIMS™ fab neo is equipped with state-of-the art components and a Windows 10 operating systems to ensure a reliable operation through the next decade.

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