AIMS 1x-193i

More accurate, faster and user-friendly

  • Highlights

    ZEISS AIMS 1x-193i is a unique photomask qualification system used in mask shops for defect review, printability analysis and repair verification for all types of high-end photomasks. It enables the user to qualify the optical performance of a mask under scanner equivalent illumination conditions.

     

    The ZEISS AIMS 1x-193i works with 193nm illumination and benefits from a completely redesigned optical system. By utilizing FlexIllu® it provides the highest level of illumination flexibility as it is able to read the scanner files for illumination. FlexIllu® sets the scanner illumination settings computer controlled.

     

    Thanks to the advances in the optical design as well as major improvements in the software the ZEISS AIMS 1x-193i achieves significantly reduced turnaround-times. The enhanced pupil uniformity realizes best scanner and tool-to-tool matching. 

     

    Another highlight is a significantly improved CD repeatability enabling more accurate defect qualification that stays ahead of the requirements of the ITRS roadmap as we move to smaller feature sizes.

     

  • More Information

    Press Release

    ZEISS enters the software sector with analysis solution.

    ZEISS has developed and released the new software solution AutoAnalysis. The application software analyses aerial images, taken by the ZEISS photomask qualification tool AIMS. Read full press release.

  • Brochure

    Enter the quantity of brochure and add to order list. Continue browsing or complete your order. All ZEISS Photomask Solutions brochures are free. All brochures.

    ZEISS AIMS 1x-193i

    Unique Mask Qualification supporting the extension of 193 nm lithography

    Page(s): 9
    File size: 1,703 kB

We use cookies on this site. Cookies are small text files that are stored on your computer by websites. Cookies are widely used and help to optimize the pages that you view. By using this site, you agree to their use. more