Mask Repair

Photomasks featuring zero printable defects

Photomasks featuring zero printable defects are essential for the manufacture of high end integrated circuits at the wafer fab. As sizes continuously shrink, the demands and costs associated with these key optical elements raise exponentially and with them the necessity to repair a defective product.


MeRiT® neXT

A paradigm shift in classical mask repair

The new ZEISS MeRiT neXT system enables the repair of smallest next generation defects. With its ZEISS low energy ebeam column the tool represents a paradigm shift in classical photomask repair.

About ZEISS MeRiT neXT
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