Semiconductor Metrology Systems
The ZEISS CDC system improves Critical Dimension Uniformity (CDU) across photomasks with high repeatability and precision. This optimizes intra-field wafer CD uniformity in the lithographic processes and guarantees highest yield for all relevant technology nodes.
The ZEISS CDC improves the yield by bringing masks back into CD Uniformity specifications. It enables to leverage existing installed mask manufacturing equipment for future nodes. CDC32 processed masks are proven to significantly enhance wafer yield and improve product binning when one or more critical layers are processed.