ZEISS ForTune

High performance Wafer and Mask Tuning system

Highlights

ZEISS ForTune is the next generation of the well established CDC and RegC^® equipment. This cutting edge system, with its latest optical design takes these two main tuning processes to the next level in terms of efficiency, accuracy and throughput.
Key Applications
Enhancing Intra-field On Product Overlay (OPO)

Improving CDU & hot/cold spot populations to expand the Lithographic Process Window

Correction of mask Image Placement Errors
Benefits
Improvement of intra-field fingerprint

Allows the user to achieve tight overlay requirements for advanced patterning

Can extend usability of a scanner

Shortens ramp-up phase and saves layer optimization repeats (APC)

No need to rewrite a mask with Image Placement Errors i.e. ForTune® can assure uninterrupted process flow

No pellicle dismantle
Brochure
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ZEISS ForTune

Next Generation Wafer and Mask Tuning System

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