ZEISS ForTune EUV

High performance Mask Tuning system for EUV technology

  • Highlights & Key Applications

    ZEISS ForTune EUV has been designed and built to support the EUV industry.
    The tool gives significant contribution in both Wafer Fabs and Mask Shop environments.

    Key Applications

    • Registration Correction of EUV mask
    • Wafer Intra-Field Overlay improvement
  • Benefits

    Benefits of ZEISS ForTune EUV

    ZEISS ForTune EUV solution achieves Registration Improvement
    (mask level) > 70%

    • Low cost and short TAT per mask correction (30 K, < 1 day)


    Reduction of intra-field Mixed & Matched Overlay (MMO)
    to sub nanometer (wafer level) following mask writer

    • ZEISS ForTune EUV improves Wafer Intra-field overlay by > 70%
  • Brochure

    ZEISS ForTune EUV

    High performance Mask Tuning system for EUV technology

    Page(s): 7
    File size: 5,115 kB

We use cookies on this site. Cookies are small text files that are stored on your computer by websites. Cookies are widely used and help to optimize the pages that you view. By using this site, you agree to their use. more