ZEISS ForTune EUV

High performance Mask Tuning system for EUV technology

  • Highlights & Key Applications

    ZEISS ForTune EUV has been designed and built to support the EUV industry.
    The tool gives significant contribution in both Wafer Fabs and Mask Shop environments.

    Key Applications

    • Registration Correction of EUV mask
    • Wafer Intra-Field Overlay improvement
  • Benefits

    Benefits of ZEISS ForTune EUV

    ZEISS ForTune EUV solution achieves Registration Improvement
    (mask level) > 70%

    • Low cost and short TAT per mask correction (30 K, < 1 day)


    Reduction of intra-field Mixed & Matched Overlay (MMO)
    to sub nanometer (wafer level) following mask writer

    • ZEISS ForTune EUV improves Wafer Intra-field overlay by > 70%
  • Brochure

    ZEISS ForTune EUV

    High performance Mask Tuning system for EUV technology

    Page(s): 7
    File size: 5,115 kB