Registration and Overlay Control
ZEISS RegC enables registration and overlay improvement on patterned masks after writing and pellicilization. Registration control by ZEISS RegC can be done by correcting each individual mask registration towards its intended ideal values – or by correcting pairs of masks purposely towards mask to mask overlay.
ZEISS RegC helps to meet the advanced mask image placement (IP) and wafer overlay specifications for DP and for EUV immersion match. There is no need to rewrite a mask due to registration errors which leads to shorter turnaround time reduced costs.
New challenging mask to mask overlay specifications can be met with ZEISS RegC. It allows to match registration footprints of different writing tools as well as exposure tools.