This unique multi-ion beam platform enables next-generation technology development with 3D analysis, rapid device/circuit prototyping and sub-10 nm node characterization capabilities. Seamlessly switch between gallium, neon and helium ion beams in a single tool for combined highest precision and speed. 

Sub-nm resolution and voltage contrast imaging

ORION NanoFab generates high resolution (0.5nm) and passive voltage contrast images of your sample in the same instrument used for fabrication. Perform defect localization and FIB registration for subsequent characterization and analysis.

Rapid device/circuit prototyping

Use maskless nano-fabrication to implement circuit design changes and validate prototypes without going through a mask change. Directly mill and pattern with ion beam induced deposition/etching. With high precision and superior endpointing, the neon beam extends FIB utility in editing advanced node technologies.  
 

Achieve high throughput and precision in a single platform

Use gallium FIB to remove bulk material. Take advantage of the neon beam for precision nanomachining with speed or use the helium beam to fabricate sub-10 nm structures. Avoid gallium beam-induced electrical device shifts with the neon and helium ion beams.

Circuit edit of advanced node technologies beyond Ga FIB capabilities

• Perform sub-50 nm IC modifications without incurring costs of a new mask set

• Enable access to buried structures for probing with high aspect ratio via milling
   

Front-end of line (FEOL) defect localization

• Identify fault location with ion beam induced passive voltage contrast
  
• Investigate buried defects in 3D easily with simultaneous neon FIB milling and imaging
   

Emerging device process optimization 

• Inspect quality of thin films and 2D semiconductors with high surface sensitivity
• Track critical dimensions through the length of high aspect ratio structurer
• Facilitate lithography/etch process characterization with superior depth of focus and edge contrast

Failure root cause investigation with 3D imaging

Milling and imaging with neon focused ion beam

Nanotomography with Ga and He focused ion beams

• ORION Nanofab brochure
• White Paper "ORION Nanofab: An Overview of Applications"