Real time process control for semiconductor processes
Is your etch chamber sometimes a black box for you?
Then the iTrap® can support you reliably in detecting even the smallest traces and enabling a comprehensive monitoring of all chemical constituents. The compact, highly sensitive ion trap Fourier Transform mass spectrometer is an ideal tool for inline process control, contamination measurement, R&D and operations.
The data is measured in real time. With detection limits down to the 1E-15 mbar range or below, every contamination is detectable. The excellent performance surpasses typical Quadrupole-RGAs by far.