About Optical Lithography

Most of the equipment we use on a daily basis today, including computers, mobile phones, cars and household appliances, contain microchips for electronic applications. Optical lithography is the basic technology used in the exposure of microchips: it is the key to the age of micro- and nanoelectronics.

Only lithography makes it possible to lay down structures for the circuit paths on the wafers from which the microchips are later made. Lithography optics by ZEISS carry out this crucial step in chip production.

Two key components

The term lithography optics thereby represents the two components of which it is constituted: projection optics and lighting (illuminator). The illuminator provides optimal lighting for the photomask. The light source is a laser; its beam is guided through a special system of lenses and mirrors. The desired structures are generated on the wafer using the projection optics system. In further process steps, the circuits are developed from these structures.

Improvement in efficiency and performance

The Semiconductor Manufacturing Technology segment is a propagator of Moore’s Law. Ever smaller, more productive, faster and more energy-efficient: that’s the goal for microchips. The continuous advances in optical lithography at ZEISS for nearly 45 years has enabled chip manufacturers worldwide to achieve this objective.

 

You want to learn more about Optical Lithography?

As a global technology leader in lithography optics and equipment, ZEISS is shaping the nanoelectronics age. This way ZEISS enables the continuation of Moore‘s Law, and with that the steady progress of the semiconductor industry.

 

Bernd Geh | The Key of Micro- and Nanoelectronics: Basics of Photolithography Optics is a key technology with inspiring applications – such as in the production of increasingly powerful microchips. Learn key aspects of the world of advanced optics for nanoelectronics in this recording of Bernd Geh’s talk on “The Key of Micro- and Nanoelectronics”. The six videos will give you an insight into the Basics of Photolithography. The learning videos are triggered by the Important Project of Common European Interest (IPCEI).

► Part 1: Introduction • General introduction into the semiconductor industry • Moore‘s Law and economic implications

► Part 2: Photolithography Basics
► Part 3: Photoresist
► Part 4: Imaging Process
► Part 5: Metrics for Lithography
► Part 6: Resolution Enhancement

 

Dr. Sascha Migura | Semiconductor Optics: Extreme Ultraviolet Lithography

Learn key aspects of the world of advanced optics for nanoelectronics in this recording of Dr. Sascha Migura’s talk on “Semiconductor Optics: Extreme Ultraviolet Lithography”. The three videos will give you a first insight into semiconductor optics for Extreme Ultraviolet (EUV) Lithography. Learn more about the development of EUV optical systems and the manufacturing processes behind the systems that will enable a continuous improvement in resolution. The learning videos are triggered by the Important Project of Common European Interest (IPCEI).

►Part 1: How Extreme Ultraviolet Lithography works