Lithography at 193 nanometers (ArF) – Product is not sold in Germany

ZEISS manufactures lithography optics operated with deep ultraviolet light (DUV) with a wavelength of 193 nanometers – with or without immersion. The light from both system types is generated through excimer lasers with argon fluoride (ArF).


As part of the wafer steppers and wafer scanners of our strategic partner ASML, 193-nanometer optics systems are used by chip manufacturers worldwide.

ArF immersion: Starlith® 1982i

The ZEISS Starlith 1982i is a very successful product made by ZEISS that works with immersion technology.

Immersion lithography uses a layer of fluid between the wafer and the optics to change the radiation beam significantly, thus increasing depth of focus and resolution. ZEISS was the first manufacturer worldwide to apply this principle in lithography production.

In 2003, ZEISS transformed the road map of optical lithography with the first prototype of an immersion optics system. Where 157-nanometer lithography was previously the technology of choice to continue the trends of Moore’s law, immersion lithography took over.

The ZEISS Starlith 1982i facilitates resolutions of less than 40 nanometers and offers chip manufacturers numerous additional options for process optimization as part of the wafer scanner.

The ZEISS Starlith 1982i is the biggest seller that the ZEISS Group ever launched on the market.

ArF dry: Starlith® 1460

The ZEISS Starlith 1460 is a lithography optics system using a wavelength of 193 nanometers in the “dry” system version.

The ZEISS Starlith 1460 is part of the Starlith 1400 system series and is an optimized version of the previous models. It works as a conventional system without immersion. The 193-nanometer technology is used here as well. The Starlith 1460 is used worldwide for the high-volume production of microchips.