Lithography at 365 nanometers (i line) – Product is not sold in Germany

Lithography optics systems of the i-line type use ultraviolet light (UV) with an exposure wavelength of 365 nanometers. A high-pressure mercury vapor lamp is used in this optics.

Starlith® 400

The ZEISS Starlith 400 works with a wavelength of 365 nanometers and is used for structuring contacting layers, for example. The optics system thereby facilitates structures of 220 nanometers.