Imaging budgets for extreme ultraviolet optics: ready for 22-nm node and beyond (Journal Paper)
Authors: Marc Bienert, Aksel Göhnermeier, Oliver Natt, et al.
Published: 01 Oct 2009

Imaging budgets for EUV optics: ready for 22-nm node and beyond (Conference Proceedings)
Authors: Marc Bienert, Aksel Göhnermeier, Oliver Natt, et al.
Published: 18 Mar 2009

Orientation Zernike Polynomials: a systematic description of polarized imaging using high NA lithography lenses (Conference Proceedings)
Authors: Tilmann Heil, Johannes Ruoff, Jens Neumann, et al.
Published: 04 Dec 2008

Performance of a 1.35NA ArF immersion lithography system for 40-nm applications (Conference Proceedings)
Authors: Jos de Kierk, Christian Wagner, Richard Droste, et al.
Published: 27 Mar 2007

Polarization influence on imaging (Journal Paper)
Authors: Michael Totzeck, Paul Graeupner, Tilmann Heil, et al.
Published: 01 Jul 2005

Predictive modeling of advanced illumination pupils used as imaging enhancement for low k1 applications (Conference Proceedings)
Authors: Tilmann Heil, Paul Graeupner, Reiner Garreis, et al.
Published: 28 May 2004

EUV imaging aerial image study (Conference Proceedings)
Authors: Martin Lowisch, Udo Dinger, Uwe Mickan, et al.
Published: 20 May 2004

How to describe polarization influence on imaging (Conference Proceedings)
Authors: Michael Totzeck, Paul Graeupner, Tilmann Heil, et al.
Published: 12 May 2004

Imaging enhancements by polarized illumination: theory and experimental verification (Conference Proceedings)
Authors: Carsten Kohler, Wim de Boell, Koen van Ingen-Schenau, et al.
Published: 12 May 2004

Impact of wavefront errors on low k1 processes at extremely high NA (Conference Proceedings)
Authors: Paul Graeupner, Reiner Garreis, Aksel Goehnermeier, et al.
Published: 26 Jun 2003

Fabrication of freeform mirrors: Metrology and figuring
Authors: H. Thiess and H. Lasser

New Products For Synchrotron Application
Based On Novel Surface Processing Developments
Author: Andreas Seifert

ACTOP 2008: Presentation
Author: H. Thiess

More publications:

• H. Thiess, H. Lasser, F. Siewert, "Fabrication of X-ray mirrors for synchrotron applications, Nuclear Instruments and Methods in Physics Research Section 2009", ISSN 0168-9002, DOI: 10.1016/j.nima.2009.10.077.

• B. Nelles, K.F. Heidemann, B. Kleemann “Design, Manufacturing and Testing of Gratings for Synchrotron Radiation”; invited talk at SRI 2000, Berlin

• M.P. Kowalski, T.W. Barbee,Jr., K.F. Heidemann, H. Gursky, J.C. Rife, W.R. Hunter, G.G. Fritz, and R.G. Cruddace: "Efficiency calibration of the first multilayer-coated holographic ion-etched grating for a sounding rocket high-resolution spectrometer" Appl. Opt. 38, 6487-6493 (1999)

• Karlfrid Osterried, Klaus Frieder Heidemann, and Bruno Nelles, ”Groove profile modification of blazed gratings by dip coating with hardenable liquids”; APPLIED OPTICS, Vol. 37, No.34, Dec. 1, 1998

• M. P. Kowalski, R. G. Cruddace, J. F. Seely and J. C. Rife; K. F. Heidemann; U. Heinzmann, U. Kleineberg, K. Osterried, and D. Menke; W. R. Hunter; “Efficiency of a multilayer-coated, ion-etched laminar holographic grating in the 14.5-16.0nm wavelength region”, OPTICS LETTERS, Vol. 22, Nr. 11, June 1, 1997

• G. Derst, H. Handschuh, M. Schmidt, K. Werner, ”Fabrication and metrology of high quality synchrotron mirrors in the sub-arcsec regime”; Proc. SPIE Vol. 3152; Materials, Manufacturing and Measurement for Synchrotron Radiation Mirrors; Peter Z. Takacs; Thomas W. Tonnessen; Eds.; p.51-58, October 1997.

• U. Kleineberg, H.-J. Stock, A. Kloid, K. Osterried, D. Menke, B. Schmiedeskamp, U. Heinzmann, D. Fuchs, G. Ulm, K. Heidemann, and B. Nelles : "Mo/Si multilayer coated laminar phase and ruled blaze gratings for the soft x-ray region"; J. Electron Spectrosc. Related Phenom. 80, 389-392 (1996)

• Kurt B. Becker, Fabrication Technologies for ”perfect optics”

• Klaus Frieder Heidemann, ”Holographically recorded ion beam etched laminar grating with groove density variation on spherical fused silica blank”

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