With different customers and partners the PRT Team evaluates the application space of the PRT. “It is amazing what is possible, if you think out of the box”, explains Markus Waiblinger. “We have removed particles from EUV pellicles, can remove tin particles coming from the EUV source quite well and expect that the tool can also be used in the EUV blank production.”
The PRT complements the existing ZEISS mask repair portfolio. PRT repairs so called soft defects (particles), whereas the e-beam based MeRiT® systems focuses on hard defects.
The system combines a SEM, an EDX and a nano-manipulator. Compared to existing technologies, it follows a “what you see is what you get” approach. It is fast, flexible and can be used for 193nm, and EUV masks, blanks and EUV pellicles.