ZEISS virtual booth at SEMICON Korea

February 2021

Visit the virtual ZEISS booth

We are pleased to welcome you on our virtual booth. Please visit our booth and learn more about our novel Mask Repair Solutions for hard and soft defects on photomasks, the ZEISS Particle Removal Tool (PRT) as well as the next generation MeRiT® system. In the field of mask tuning, we present different applications for EUV and DUV. 

To get to the ZEISS booth please fill out the form below.

SEMICON Korea 2021

Low energy technology for ultra-small defects

MeRiT® LE

Low energy technology for ultra-small defects

Particle Removal Tool using real-time imaging

PRT

Low energy technology for ultra-small defects

Prevent excursions and improve yield of EUV masks

ForTune EUV

Prevent excursions and improve yield