ZEISS at SPIE Photomask Technology + EUV Lithography

Monterey Conference Center and Monterey Marriott

15 - 19 September 2019

Monterey, California, USA

.. Days .. Hours .. Minutes .. Seconds

Electrons and defects - fast but also furious?

Lunch & Learn Session

Date, Time & Location

Wednesday, 18 September
Start: 12.30 pm
End: 01.30 pm

Room Santa Monica
Marriott Hotel

Speakers at SPIE Conference

Application Engineer
Dr. Kokila Egodage

Presents: SEM AutoAnalysis for reduced turnaround time and to ensure high repair quality of EUV photomasks

Sr. Principal Architect
Richard van Haren

Presents: Wafer alignment mark placement accuracy impact on the layer to layer overlay performance

Lead Systems Engineer
Renzo Capelli

Presents: A portrait of the complex signature of EUV masks in the EUV imaging process

Independent Consultant
Rolf Seltmann

Presents: Improving chip performance by photomask tuning: ultimate intra-field CD control as a major part of an overall excursion prevention strategy

Poster I - Dr. Kokila Egodage

SEM AutoAnalysis for reduced turnaround time and to ensure high repair quality of EUV photomasks

 

In the defect repair domain, the tool MeRiT® has met industry demands and expectations with EUV repairs. Following the optical counterpart, a digital solution, SEM AutoAnalysis (SAA), was developed that carries out a quick SEM image-based quality assessment in a fully automated manner. This poster presents a comparison of SAA results with the AIMS™ EUV measurements analyzed with AAA EUV. SAA can provide a valuable preliminary assessment of mask repairs and this is a vital step towards a fully automated BEOL.

Date & Time

Monday, 16 September 
04.00 pm - 05.50 pm

Location

Monterey Marriott
San Carlos Ballroom 4

 

Location

Monterey Marriott,
San Carlos Ballroom 4
 

Date & Time

Monday, 16 September    
06.00 pm - 07.30 pm

Poster II - Richard van Haren

Wafer alignment mark placement accuracy impact on the layer to layer overlay performance

It has been demonstrated that the mask-to-mask overlay contribution can be fully characterized by off-line registration measurements on the PROVE® mask registration tool. This characterization includes the impact of the marks that are used for reticle alignment inside the scanner. This is an important aspect since the scanner is blind to the features inside the image field and intra-field adjustments are only based on measurements of the reticle alignment marks.

Paper I - Renzo Capelli

A portrait of the complex signature of EUV masks in the EUV imaging process

Focus of the paper is the EUV Mask Error Enhancement Factor, and how signatures which can be observed on wafer prints can be attributed to the mask. The NXE:3400 ATP mask was measured with AIMS™ EUV in a first time ever collaboration with ASML, alongside with Intel Santa Clara, and the aerial image results will be discussed in association with simulations and wafer prints.

Date & Time

Thuesday, 17 September 
08.10 am - 10.10 am

Location

Monterey Conference Center,
Steinbeck 2

Location

Monterey Conference Center,
Steinbeck 2

Date & Time

Thuesday, 17 September    
01.50 pm - 03.30 pm 

Paper II - Rolf Seltmann

Improving chip performance by photomask tuning: ultimate intra-field CD control as a major part of an overall excursion prevention strategy

Device performance is of utmost importance for device makers. We will describe and analyze how improving wafer intrafield CDU by mask tuning will reduce the probability of wafer printing defects.

ZEat + Meet

Dinner Event

Date, Time & Location

Tuesday, 17 September
Start: 06.00 pm

The Barns at Cooper Molera
535 Polk Street, Monterey

Best Student Poster Award

ZEISS sponsors US $2000

The ZEISS Award for Talents in the Industry was established to support students working in the fields of photomask and EUV lithography. The Award Announcement takes place after the Panel Discussion on Wednesday 9/18, in the Conference Center, Steinbeck 2, around 6.00 pm.

The SPIE Photomask + EUV Lithography symposium student posters will be assessed by an award committee consisting of members of the program committee from both conferences. Contributions will be judged for technical merit of the poster, relevance of the topic to the industry and the author’s ability to explain the work.

ZEISS Booth #209

Visit experts during the technical exhibition

Date & Time
  • Tuesday 17 September            10.00 am to 4.00 pm
  • Wednesday 18 September       10.00 am to 4.00 pm

Registration Form

Please insert your contact information

#SPIEPhotomaskEUV #ZEISS #monterey #photomask #lithography

SPIE Conference

Monterey Conference Center and Monterey Marriott
Location

Monterey Convention Center
1 Portola Plaza, CA 93940 Monterey
USA

ZEISS at SPIE

1 Portola Plaza, Monterey
CA 93940
USA

Directions