High quality Nanopatterning & Nanolithography

The most ambitious research challenges in nanolithography and nanofabrication require cutting-edge solutions that leverage the latest advances from manufacturers of equipment for nanofabrication, nanostructure and nanoobject imaging and analysis. ZEISS GEMINI systems like Crossbeam or GeminiSEM combined with RAITH ELPHY nanofabrication upgrade kits represent one of the most efficient, professional and flexible solutions for the most diverse and novel research applications.

The electron lithography system combines a scanning electron microscope with ZEISS GEMINI column and RAITH ELPHY pattern generators, which turns GeminiSEM and Crossbeam FIB-SEM microscopes into advanced imaging and lithography systems for nanoengineering. Such systems can be used for both creating objects in the nm scale imaging with high resolution and maximum flexibility of the imaging conditions (e.g. low kV), and for analyzing the structures with diverse techniques available on-board, as the systems maintain the highest level of versatility, thanks to multiple SEM/FIB accessories.

Join us for this webinar to learn more about ZEISS/RAITH EBL solution, its high reliability based on unique properties of the ZEISS FE-SEM GEMINI column, ZEISS IonSculptor FIB column and RAITH ELPHY attachment , which allows development of new materials and devices with special properties with high precision.