The World’s Fastest Scanning Electron Microscopes
ZEISS MultiSEM Research Partner Program
MultiSEM 505/506
The World’s Fastest Scanning Electron Microscopes
Revolutionize the Speed of Electron Microscopy
With MultiSEM you unleash the acquisition speed of up to 91 parallel electron beams. Now, you can image samples in the centimeter – scale at nanometer resolution. This unique scanning electron microscope (SEM) is designed for continuous, reliable 24/7 operation. Simply set up your high-throughput data acquisition workflow and your MultiSEM will acquire high contrast images automatically, all by itself.
You control MultiSEM with the proven ZEN imaging software from ZEISS: all options of this powerful SEM are organized in an intuitive yet flexible way.
Innovation Award 2015
Microscopy Today Innovation Award for ZEISS MultiSEM 505 scanning electron microscope
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Mouse brain
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Silicon test sample
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Femoral neck sample
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Zebrafish brain
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Graphical processor
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Integrated circuit
Highlights
Acquire Your Images at Highest Speed and Nanometer Resolution
- Profit from up to 91 electron beams working in parallel with unprecedented imaging speed.
- Image an area of 1 cm² at 4 nm pixel size in less than 3 hours.
- Acquire high contrast images at low noise levels, thanks to optimized SE detection.
Acquire and Image Huge Samples
- MultiSEM is equipped with a sample holder covering an area of 10 cm x 10 cm.
- Image the entire sample and discover everything you need to answer your scientific questions.
- Automated acquisition protocols enable large area imaging - you will get the detailed nanoscale picture‚ without losing the macroscopic context.
ZEN Imaging Software
- You control MultiSEM in a straightforward, intuitive way: with ZEN - the proven software for all ZEISS imaging systems.
- Smart auto-tuning routines support you as you capture images with high resolution and high contrast.
- You quickly and easily set up complex automated acquisition procedures, adapted and tuned to your samples.
Technology
MultiSEM uses multiple electron beams (green: illumination path) and detectors in parallel. A finely tuned detection path (red) collects a large yield of secondary electrons (SE) for imaging. Each beam carries out a synchronized scanning routine at one sample position, resulting in a single sub-image. The electron beams are arranged in a hexagonal pattern. The full image is formed by merging all image tiles.
A parallel computer setup is used for fast data recording, which increases the total imaging speed. Image acquisition and workflow control are fully separated in the MultiSEM system.
Integrated Workflow
Serial Array Tomography for Acquisition of Large Volumes
- Section your resin-embedded biological tissue automatically with the ATUMtome. Collect up to 1000 serial sections in a single day.
- Mount the section tape on a silicon wafer and image the sample with a light microscope from ZEISS. With ZEN imaging software and Shuttle & Find you create an overview image. Then transfer the wafer to your MultiSEM and use the overview to navigate your sample and plan your experiment using the familiar ZEN user interface.
- You set up your whole experiment with a single graphical control center. Save time with the efficient automated section detection to identify and target your regions of interest.
Research Partner Program
Get access to groundbreaking technology at an early stage. The ZEISS MultiSEM Research Partner Program is created for early adopters. Be part of this exciting program, work in a close relationship with ZEISS and profit from the opportunities of this new technology.
ZEN 2 Browser
View Demo-Samples here
Downloads
ZEISS MultiSEM - Research Partner Program
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External Publications
Brain mapping in high resolution - nature.com (Neurobiology)
Connectomics (Cell Press Nucleus)
High throughput data acquisition with a multi-beam SEM
Mission (im)possible – mapping the brain becomes a reality
High-resolution, high-throughput imaging with MultiSEM 505
Multiple-Beam Scanning Electron Microscopy (Microscopy Today)
Further advancing the throughput of a multi-beam (Metrology, Inspection, and Process Control for Microlithography)