Press release

ZEISS AIMS EUV 3.0: New Generation Triples Mask Throughput

8 September 2025 · 5 min read
  • The new generation of the AIMS® EUV 3.0 mask qualification tool from ZEISS SMT has been successfully established on the market.
  • Customers benefit from high uptime, full performance, and cost-optimized features.
  • The future-proof platform supports the wafer scanner roadmap with Low-NA EUV and High-NA-EUV technology.
Oberkochen, Germany / Taipei, Taiwan | 8 September 2025 | ZEISS Semiconductor Manufacturing Technology

ZEISS AIMS systems (Aerial Image Measurement Systems) have been setting standards in mask qualification for over 30 years. Now, the Semiconductor Manufacturing Technology (SMT) segment of ZEISS has successfully introduced the new generation AIMS® EUV 3.0 to the market. The system supports both Low-NA EUV and the advanced High-NA-EUV technology, significantly increases productivity, and enables a threefold increase in mask throughput. Initial systems are already in use at chip manufacturers and are meeting expectations for performance and availability.

In a white, brightly lit cleanroom stands a device for mask qualification. Two people in protective suits are working on the device.

The latest generation of the ZEISS AIMS® EUV 3.0 system significantly triples mask throughput. The cutting-edge platform is designed to support both Low-NA and High-NA EUV lithography, and has already proven its success in the market.

ZEISS SMT has consolidated its photomask expertise within the strategic business unit Semiconductor Mask Solutions (SMS). “The photomask is the heart of lithography and therefore a key driver of performance in modern microchips,” says Dr. Clemens Neuenhahn, Head of ZEISS SMS. Defect-free photomasks are essential for cost-effective and sustainable microchip production. Chip manufacturers review mask defects before they are used in wafer steppers and scanners, allowing potential impacts on printability to be identified early and corrected.

ZEISS AIMS EUV is a proven tool that evaluates the printing performance of EUV masks and replicates the imaging characteristics of scanners. With the new generation AIMS® EUV 3.0, ZEISS SMT is addressing the industry’s increasing demand for more productive systems and optimized cost structures.

“With AIMS® EUV 3.0, we’re offering a future-proof solution that delivers technological excellence and creates real added value for our customers in everyday production – through higher productivity, flexibility, and operational reliability,” says Neuenhahn.

High Availability and Full Performance in Ongoing Operation

ZEISS has delivered, installed, and successfully commissioned the first two systems of the new AIMS® EUV generation at two chip manufacturers. In operation, they meet technical expectations and impress with high availability, stable performance, and optimal efficiency.

“The positive customer feedback confirms that with AIMS® EUV 3.0, we are addressing the requirements that are crucial for the next generation of semiconductor manufacturing. It motivates us to continue this journey together with our customers and partners,” says Dr. Axel Zibold, Head of Sales & Customer Support at ZEISS SMT.

Future-Proof Platform for Low-NA and High-NA-EUV Lithography

AIMS® EUV 3.0 is based on the proven optical design of its predecessor and is fully compatible with High-NA-EUV technology. The platform supports imaging for both Low-NA technology (0.33NA isomorphic) and High-NA-EUV technology (0.55NA anamorphic). This enables chip manufacturers to respond more flexibly to varying requirements and secure strategic advantages along their roadmaps.

At the same time, they benefit from enhanced features: the new AIMS® generation triples mask throughput compared to the previous version, thereby increasing productivity. Another key feature is flexible illumination, which allows for customized light settings tailored to specific mask requirements. This makes it possible to replicate even complex EUV scanner settings.

Portrait of Jeannine Rapp
Press Contact Jeannine Rapp Carl Zeiss SMT GmbH
Portrait of Jeannine Rapp
Press Contact Jeannine Rapp Carl Zeiss SMT GmbH

About ZEISS

ZEISS is an internationally leading technology company in the optics and optoelectronics industry. The ZEISS Group generated annual revenue totaling around 11 billion euros in its four segments Industrial Quality & Research, Medical Technology, Consumer Markets and Semiconductor Manufacturing Technology (updated: 30 September 2024).

For its customers, ZEISS develops, produces, and distributes highly innovative solutions for industrial metrology and quality assurance, microscopy solutions for life sciences and materials research, as well as medical technology solutions for diagnostics and treatment in ophthalmology and microsurgery. The name ZEISS is also synonymous with the world's leading lithography optics, which are used by the chip industry to manufacture semiconductor components. There is global demand for trendsetting ZEISS brand products such as eyeglass lenses, camera lenses and binoculars.

With a portfolio aligned with future growth areas like digitalization, healthcare and Industry 4.0 as well as a strong brand, ZEISS is shaping technological progress and, through its solutions, is extending the horizon of the world of optics and associated areas. ZEISS' significant, sustainable investments in research and development lay the foundation for the success and continued expansion of ZEISS' technology and market leadership. ZEISS invests 14% of its revenue in research and development work – ZEISS has a long tradition of high expenditure in these areas. This also represents the company's investment in the future.

With more than 46,555 employees, ZEISS operates in around 50 countries with more than 60 sales and service sites, 40 research and development sites and 35 production sites worldwide (as of 31 March 2025). The headquarters of the company, which was founded in Jena in 1846, is located in Oberkochen, Germany. The Carl Zeiss Foundation, one of Germany’s largest foundations committed to the promotion of science, is the sole owner of the holding company, Carl Zeiss AG.

Further information at www.zeiss.com

 

Semiconductor Manufacturing Technology

With its product portfolio and expertise, the Semiconductor Manufacturing Technology segment of ZEISS covers a variety of key processes in the production of microchips. Its products include semiconductor manufacturing optics – notably lithography optics – as well as photomask systems and process control solutions for semiconductor manufacturing. Thanks to ZEISS technology, microchips are becoming increasingly smaller, more powerful, more energy-efficient and more affordable. The electronic applications of these ongoing enhancements enable global progress in many disciplines such as technology, electronics, communication, entertainment, mobility and energy. Semiconductor Manufacturing Technology is headquartered in Oberkochen. Other sites include Jena, Rossdorf, Wetzlar, Aachen and Coswig (Germany), Zurich (Switzerland), as well as Bar Lev (Israel) and Dublin, CA (USA). ZEISS SMT also operates various sales and service sites in the US, China, Taiwan (region), South Korea and Japan.

Press Photos

  • ZEISS AIMS EUV 3.0

    The latest generation of the ZEISS AIMS® EUV 3.0 system significantly triples mask throughput. The cutting-edge platform is designed to support both Low-NA and High-NA EUV lithography, and has already proven its success in the market.

    4 MB