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The image shows the ZEISS EUV illumination system in a clean room with a man. The system consists of 15,000 individual parts and weighs 1.5 tons.
1 April 2025

Extremely precise, extremely successful: 30 years of EUV lithography optics at ZEISS SMT

Press Release - 4 min read
Imec and ZEISS are intensifying their collaboration. Therefore, both parties have signed a Strategic Partnership Agreement. With the signed agreement, the two cooperation partners reaffirm their joint efforts to advance key semiconductor manufacturing technologies such as High-NA-EUV lithography.
20 March 2025

Imec and ZEISS intensify collaboration with the signing of a new Strategic Partnership Agreement

Press Release - 5 min read

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