Karoline works at a place where progress is created. This has been true since she wrote her doctoral thesis at CERN, as part of the research team that proved the existence of the Higgs particle. "After that I wanted to focus on advancing and innovating products," she says. And that's exactly what she did - by turning her attention to the automation of production and measuring processes for the world's most precise mirrors. She is the interface between colleagues working in Production and those working with highly complex measuring machines. She and her team make sure that the high-tech mirrors used in EUV lithography are manufactured in the first place, and can then be used to produce microchips. The resulting new chip generation raises the bar in digitalization. Karoline heads up the Automation department for Production and Measuring Processes at the ZEISS Semiconductor Manufacturing Technology segment. She also campaigns for greater diversity and has joined networks committed to helping more women assume leadership positions.

Marek manufactures frames for the lenses used to produce microchips. What does he think it comes down to? Getting stuck in and putting your ideas forward. That's how he helps make microchips even smaller, more powerful and more energy-efficient. Marek works in production at ZEISS. Measurement results that are 100% accurate give him a real sense of achievement every day.

Martin's passion for science applies to surfaces – a precision research in the nanometer range. While at university, he contributed to 25 articles in international journals. But he wasn't content with merely seeing his research in writing: "It's fantastic to see how my scientific work is now impacting how groundbreaking products are manufactured." As a PhD physicist, Martin now works in a high-tech industrial environment, where scientific ideas enable the technologies of tomorrow. Martin is a process developer at the ZEISS Semiconductor Manufacturing Technology segment. As a surface specialist, he develops polishing processes for current & future lithography optics.