ZEISS MeRiT systems Photomasks featuring zero printable defects by e-beam based mask repair
Scaling trends towards smaller technology nodes and feature sizes are continuing and EUV technology is becoming increasingly important in the semiconductor industry. Associated complexity in mask manufacturing raises significantly and with them the necessity to repair defective high-end photomasks. With MeRiT® ZEISS offers optimized solutions for the repair of all kinds of photomasks enabling the repair of smallest defects.
MeRiT® LE Low energy technology for ultra-small defects
ZEISS MeRiT® LE represents the next generation repair tool for high-end photomasks, particularly focusing on EUV repairs.
State-of-the art e-beam photomask repair
MeRiT® neXT tool is the industry standard for high-end photomask repairs.
MeRiT® MG neo
Optimized repair tool for mature nodes
Using proven and state-of-the-art components, ZEISS presents the MeRiT® MG neo as a solution for the needs of the cost driven mature market of 45nm node and above.
Running on the computational engine FAVOR®
The FAVOR® platform enables productivity and reliability enhancement through intelligent automation. ZEISS offers several automation applications. All listed solutions are supported by the MeRiT® technology.
Defect-free mask manufacturing — Smallest defect repair enables flawless mask production
It is essential to manufacture defect-free masks, as every defect on the photomask will be printed multiple times on the wafer resulting in defective microchips. As almost every mask has defects, a reliable and effective repair technology is needed. Gas-assisted electron-beam (e-beam) lithography enables the repair of every kind of defect on all kinds of masks. Especially for very small features sizes as they occur on EUV masks, MeRiT® is the only available solution on the market that is able to reliably repair these defects.