ORION NanoFab

ORION NanoFab Helium Ion Microscope

Move beyond sub-10nanometer imaging of charged specimens and nanofabrication applications

EVO® HD – High Performance, Total Flexibility

Fabricate sub-10nm Nanostructures with Speed and Precision

Seamlessly switch between gallium, neon and helium beams with ORION NanoFab:

Use the neon beam to machine nanostructures at great speed and achieve high throughput.
Use the helium beam to create delicate sub-10 nm structures.
Use optional gallium FIB to remove massive material.

With ORION NanoFab you profit from the only system in the world that covers the complete range of micromachining to nanomachining applications using gallium, neon and helium ion beams integrated in a single instrument.

What our customers say

"The Orion Helium Ion Microscope is a unique platform for our research and technology activities in instrument development for nano-analytics, leading to exciting capabilities for cutting edge nano-imaging, nano-analysis and correlative microscopy."

Tom Wirtz
Luxembourg Institute of Science and Technology (LIST)
Belvaux, Luxembourg

May 7, 2015

What our partners say

“We are happy to announce that ZEISS Microscopy and Raith have joined forces for users of Helium Ion Microscopy and nanofabrication. As a number of ZEISS ORION NanoFabs are already equipped with Raith ELPHY pattern generators, both Raith and ZEISS have built up significant expertise in this area. Based on this experience we were able to consult users from the early stages of development. This partnership will add significant value in the decision making process towards ZEISS ORION NanoFab to new and existing users to leverage the unique features of this innovative instrument.”

Learn more

Ralf Jede
Raith GmbH
Dortmund, Germany

July 6, 2017

Highlights

Fast machining of sub-10 nm structures
Use neon and helium ion beams to create delicate sub-10 nanometer structures that demand extremely high machining fidelity. Whether your application is material removal using sputtering, gas induced etching or deposition or lithography, ORION NanoFab excels in sub-10 nm fabrication with speed and ease.
Three beams in one instrument
Use gallium FIB to remove massive material. Take advantage of the neon beam for precision nanomachining with speed or use the helium beam to fabricate delicate sub-10 nm structures. With neon and helium ion beams you avoid deposit contamination.
High resolution imaging
With imaging resolution of 0.5 nm, ORION NanoFab generates high resolution images of your sample in the same instrument that you used for fabrication. Gain new insights with images that have 5 to 10 times greater depth of field when compared to images acquired with FE-SEMs.

Nanopatterning

Orion NanoFab features the Nanopatterning and Visualization Engine - an integrated hardware and software control system. NVPE incorporates a dedicated 16 bit scan generator for each NanoFab column and dual signal acquisition hardware supporting real-time advanced patterning and visualization. Completely control the beam by a GUI: create a range of fully editable shapes including rectangles, trapezoids, polygons, lines, polylines, ellipses and spots. Vectorfill these shapes while maintaining full control over dose variation and patterning parameters.