ORION NanoFab
ORION NanoFab
Helium Ion Microscope – move beyond sub-10nanometer imaging of charged specimens and nanofabrication applications

ORION NanoFab

3-in-1 Multibeam Ion Microscope for Sub-10nm Nanostructuring

Fabricate sub-10nm nanostructures with speed and precision

Seamlessly switch between gallium, neon and helium beams with ORION NanoFab:

  • Use the neon beam to machine nanostructures at great speed and achieve high throughput.
  • Use the helium beam to create delicate sub-10 nm structures.
  • Use optional gallium FIB to remove massive material.


With ORION NanoFab you profit from the only system in the world that covers the complete range of micromachining to nanomachining applications using gallium, neon and helium ion beams integrated in a single instrument.

What our customers say

"The Orion Helium Ion Microscope is a unique platform for our research and technology activities in instrument development for nano-analytics, leading to exciting capabilities for cutting edge nano-imaging, nano-analysis and correlative microscopy."
 

Tom Wirtz
Luxembourg Institute of Science and Technology (LIST)

Belvaux, Luxembourg

May 7, 2015

What our partners say

“We are happy to announce that ZEISS Microscopy and Raith have joined forces for users of Helium Ion Microscopy and nanofabrication. As a number of ZEISS ORION NanoFabs are already equipped with Raith ELPHY pattern generators, both Raith and ZEISS have built up significant expertise in this area. Based on this experience we were able to consult users from the early stages of development. This partnership will add significant value in the decision making process towards ZEISS ORION NanoFab to new and existing users to leverage the unique features of this innovative instrument.”

         Learn more

 

          Ralf Jede
          Raith GmbH
          Dortmund, Germany

          July 6, 2017

          

 

Highlights

  • Fast machining of sub-10 nm structures
    Use neon and helium ion beams to create delicate sub-10 nanometer structures that demand extremely high machining fidelity. Whether your application is material removal using sputtering, gas induced etching or deposition or lithography, ORION NanoFab excels in sub-10 nm fabrication with speed and ease.

  • Three beams in one instrument
    Use gallium FIB to remove massive material. Take advantage of the neon beam for precision nanomachining with speed or use the helium beam to fabricate delicate sub-10 nm structures. With neon and helium ion beams you avoid deposit contamination.

  • High resolution imaging
    With imaging resolution of 0.5 nm, ORION NanoFab generates high resolution images of your sample in the same instrument that you used for fabrication. Gain new insights with images that have 5 to 10 times greater depth of field when compared to images acquired with FE-SEMs.

Nanopatterning

Orion NanoFab features the Nanopatterning and Visualization Engine - an integrated hardware and software control system. NVPE incorporates a dedicated 16 bit scan generator for each NanoFab column and dual signal acquisition hardware supporting real-time advanced patterning and visualization. Completely control the beam by a GUI: create a range of fully editable shapes including rectangles, trapezoids, polygons, lines, polylines, ellipses and spots. Vectorfill these shapes while maintaining full control over dose variation and patterning parameters.

Watch the Product Trailer

Watch the Webinar

Multiple ion beam microscopy for advanced nanofabrication

Explore the brand new technology of multiple ion beam microscopy, from the science to the first emerging results.

Webinar

Downloads

ORION NanoFab

Three Ion Beams for Total Flexibility in Sub10-nm Fabrication

Pages: 16
Filesize: 5,416 kB

White Paper: Sub-10 nm Nano-machining with Multiple Ion Beams

for High Precision and High Throughput Applications

Pages: 5
Filesize: 1,923 kB

White Paper: Advancing Oil and Gas Exploration with ORION NanoFab

Pages: 6
Filesize: 2,807 kB

White Paper: ORION NanoFab: An Overview of Applications

Pages: 6
Filesize: 1,425 kB

White Paper: ORION NanoFab - Plasmonic Devices Fabricated with Helium Ion Microscopy

Pages: 5
Filesize: 2,478 kB

Application Note: ZEISS ORION NanoFab

Imaging Polymers with a Helium Beam

Pages: 5
Filesize: 1,502 kB

Application Note: ZEISS ORION NanoFab

Rapid Fabrication of Nanopores with Helium Ion Beam and Automation Over a Wafer Size

Pages: 7
Filesize: 3,522 kB

We use cookies on this site. Cookies are small text files that are stored on your computer by websites. Cookies are widely used and help to optimize the pages that you view. By using this site, you agree to their use. more