Ensuring defect-free photomasks
With ZEISS AIMS systems
It is crucial to qualify all photomasks regarding defects, understand their impact on the printing performance of the mask and eliminate them before the mask is used in a stepper or scanner. AIMS® is the only system which qualifies the photomask under scanner equivalent conditions covering all lithography techniques including Double Patterning, Source Mask Optimization (SMO) and Inverse Lithography.
Platform for actinic EUV measurements provides full emulation
ZEISS opens up a new era of actinic mask qualification with the new generation of AIMS® EUV.
Ensures perfect printing performance for high-end masks
ZEISS AIMS 1x-193i is used for defect review, printability analysis and repair verification and qualifies photomasks with high precision and accuracy for today technology nodes.
AIMS® 32-193i SE
Enhanced flexibility for defect qualification of 193nm mature masks
ZEISS AIMS 32-193i SE is dedicated to 193 nm mature products which require a considerable flexibility for defect verification but facing the challenge of cost effectiveness.
AIMS® fab neo
Equipped with state-of-the art components for 248nm defect qualification
ZEISS AIMS fab neo provides the capability to perform defect and repair verification for 248 nm photomasks at high productivity.
Scanner-equivalent illumination conditions
AIMS® works under the same optical conditions as the scanner and enables to qualify the printing performance of the photomask already in the Mask Shop. The technology addresses the challenges of increased complexity, tighter mask specifications and more accurate and reliable defect disposition. Along the tool generations more complex illumination schemes have been required resulting in FlexIllu®, a computer controlled illumination, for ZEISS’ DUV high-end system which is a key enabler for SMO technologies. Furthermore, the systems account for all optical effects including vector effects and 3D mask effects which is of utmost importance to qualify the printing behavior of a photomask.
The AIMS® 1x-193i is equipped with the LITO™ grade optics which provides aberration correction for the latest scanner technology and together with the enhanced pupil uniformity it contributes to an excellent scanner and tool to tool matching.
Comprehensive performance upgrades
The latest generation ZEISS AIMS 1x-193i can be enhanced by comprehensive performance upgrades to boost the system capabilities with respect to CD repeatability and throughput to keep with ongoing technology demands. For AIMS® EUV, ZEISS offers platform extensions such as Digital Flex Illu, Phase Metrology and HiNA Upgrade to support our customers with the ongoing technology needs. On top of that, latest automation features such as AIMS® AutoAnalysis can significantly increase the productivity and reliability.
Tailored to your needs
ZEISS offers a broad spectrum of tool generations tailored to your needs. The systems are optimized for different illumination wavelength and applications and target specific market needs. ZEISS EUV and 193 nm high-end AIMS systems fulfill the requirements of the high end market driven by high feature complexity, complex illumination schemes and steadily tightening of defect and mask specification. The mature market requires robust processes, high productivity and cost effective solutions. These requirements are addressed with ZEISS’ 193 nm and 248nm AIMS systems.