Enabling Chip Manufacturers

Pacesetter for Digitalization

Intel PQS Award

ZEISS AIMS™ 1x-193i

More accurate, faster and user-friendly

AIMS™ 1x-193i is a unique mask qualification system used in mask shops for defect review, printability analysis and repair verification for all types of high-end photomasks. It enables the user to qualify the optical performance of a mask under scanner equivalent illumination conditions.

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ZEISS Process Gas Analyzer

Real time process control for various applications

The compact, highly sensitive ion trap Fourier Transform mass spectrometer detects every trace contamination and process constituent in real time. It is an ideal tool for inline process control, contamination measurements, R&D and operations.

ZEISS Semiconductor Manufacturing Technology

Semiconductor Manufacturing Optics

Partially products are not sold in Germany

With lithography optics and other optical systems, ZEISS enables customers all over the world to produce extremely powerful microchips.

Photomask Solutions

Our high-resolution photomask solutions are used to manufacture flawless photomasks for chip production worldwide.

Process Control and Failure Analysis

Leveraging ZEISS’s broad technology portfolio to provide unique failure analysis and measurement solutions to the semiconductor industry.

Process Gas Analysis

With the innovative ion trap mass spectrometer ZEISS customers detect every trace contamination in real time.

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Product Highlights

Starlith® EUV Optics*

Process Gas Analyzer

MeRiT®

Starlith® 1000*

AIMS™

Starlith® 400*

ForTune

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PROVE®

Starlith® 1950i*

* Product is not sold in Germany