MeRiT® AutoAnalysis for higher productivity and time savings

MeRiT^® AutoAnalysis MAA provides a fully automated analysis solution for photomask repair workflows on MeRiT^®. Independent of the tool software, pre and post repair SEM images can be analyzed in parallel to other activities which leads to significant time savings. Apart from the availability of the analysis history in one single place, the application offers sophisticated analysis strategies compatible with high end EUV mask repairs. High sensitivity to defect detection ensures quality targets and prevents users to overlook required repair rework.